Polarization Signal Amplification of 2D GeSe‐Based Polarization‐Sensitive Photodetectors

K Kexin He W Wenhao Ran S Shaodi Xu (School of Integrated Circuits Peking University Beijing 100871 China) J Jie Wen (State Key Laboratory of Pulp and Paper Engineering, Guangdong Provincial Key Laboratory of Fuel Cell Technology, School of Chemistry and Chemical Engineering) S Siqi Qiu (State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing P. R. China) T Tingwei Liu (Department of Chemistry Key Laboratory of Organic Optoelectronics and Molecular Engineering of the Ministry of Education Tsinghua University Beijing China) K Kaiyao Xin (State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing P. R. China) Y Yali Yu D Duan‐Yang Liu (State Key Laboratory of Coordination Chemistry Jiangsu Key Laboratory of Advanced Organic Materials Chemistry and Biomedicine Innovation Center (ChemBIC) School of Chemistry and Chemical Engineering Nanjing University Nanjing 210023 China) Q Qianqian Huang G Guozhen Shen Z Zhongming Wei Z Ziqi Zhou (School of Chemical and Biomolecular Engineering, Faculty of Engineering)

Abstract

Abstract Polarization‐sensitive photodetectors, resolving light intensity, wavelength, and polarization states, enable the characterization of probing microstructure, internal stress, and compositional heterogeneity. Polarizer‐free polarization‐sensitive photodetectors based on in‐plane anisotropic 2D semiconductors offer potential for device miniaturization and on‐chip integration, owing to their inherent linear dichroism and orientation‐dependent carrier mobilities. Hundreds of in‐plane anisotropic 2D materials have been successfully discovered; however, the limited anisotropic photocurrent ratio (PR<10) has hindered the practical application. Herein, a field‐effect transistor (FET)‐based amplification strategy, enhancing PR from 2.1 to 54.8 in 2D GeSe photodetectors is proposed. This significant PR enhancement arises from polarization‐induced resistance variations dynamically modulating gate potentials. Coupled with a steep transistor subthreshold region, small gate fluctuations produce substantial drain current changes, amplifying output anisotropy sensitively. Evaluating four types of FET identifies SMT‐Si transistors as optimal due to their high stability, sharp subthreshold, and excellent noise immunity. In addition, the amplified PR signal directly enhances image contrast and recognition accuracy. Notably, with a high‐PR signal, the machine learning model achieves a recognition rate of 0.99 in only 17 training epochs, reflecting a computational cost reduction of over 60%. This work provides an effective strategy to enhance PR, benefiting from high‐resolution polarization imaging and advanced optoelectronic sensing.

Article Details

Volume / Issue Vol. 37, Issue 39
Published October 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (13)

K

Kexin He

W

Wenhao Ran

S

Shaodi Xu

School of Integrated Circuits Peking University Beijing 100871 China

J

Jie Wen

State Key Laboratory of Pulp and Paper Engineering, Guangdong Provincial Key Laboratory of Fuel Cell Technology, School of Chemistry and Chemical Engineering

S

Siqi Qiu

State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing P. R. China

T

Tingwei Liu

Department of Chemistry Key Laboratory of Organic Optoelectronics and Molecular Engineering of the Ministry of Education Tsinghua University Beijing China

K

Kaiyao Xin

State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing P. R. China

Y

Yali Yu

D

Duan‐Yang Liu

State Key Laboratory of Coordination Chemistry Jiangsu Key Laboratory of Advanced Organic Materials Chemistry and Biomedicine Innovation Center (ChemBIC) School of Chemistry and Chemical Engineering Nanjing University Nanjing 210023 China

Q

Qianqian Huang

G

Guozhen Shen

Z

Zhongming Wei

Z

Ziqi Zhou

School of Chemical and Biomolecular Engineering, Faculty of Engineering