Polarization Sensitive Vacuum‐Ultraviolet Photodetectors Based on <i>m</i> ‐Plane h‐BN

L Le Chen Z Ze Long (State Key Laboratory of High Pressure and Superhard Materials, College of Physics, Jilin University , Changchun 130012,) J Jishan Liu (Shanghai Synchrotron Radiation Facility) L Lu Liu Z Zhongyuan Han (School of Integrated Circuits) K Kexiong Zhang (School of Integrated Circuits Dalian University of Technology Dalian 116024 P. R. China) H Hongwei Liang (School of Integrated Circuits) H Hong Yin

Abstract

Abstract Vacuum ultraviolet (VUV) detection plays an essential role in space science, radiation monitoring, electronic industry, and fundamental research. Integrating polarization characteristics into VUV detection enriches the comprehension of the target attributes and broadens the signal dimensionality. Polarization detection has been widely developed in visible and infrared regions; however, it is still relatively unexplored in VUV light due to the lack of photoactive materials with low‐symmetry structures, VUV selective response and radiation resistance. Here, the wafer‐scale hexagonal boron nitride (h‐BN) epitaxial films with the distinct m ‐plane surfaces are demonstrated that exhibit significant anisotropy due to space symmetry breaking, instead of the routinely obtained high‐symmetry c ‐planes governed by the most thermodynamically stable growth mode. This results in notable anisotropy in light absorption and charge density distributions, yielding a dichroic ratio greater than 10 and a carrier transport efficiency ratio ( μτ a ‐axis / μτ c ‐axis ) of 24. The h‐BN based detector achieves a high polarization ratio of 6.2 for 188 nm VUV polarized light, reaching the short‐wavelength limit of the reported polarization‐sensitive photodetectors. This work presents an effective strategy for designing polarized VUV photodetector from h‐BN, and paves the road towards the novel integrated optoelectronics, photonics and electronics based on traditional 2D materials.

Article Details

Volume / Issue Vol. 37, Issue 29
Published July 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (8)

L

Le Chen

Z

Ze Long

State Key Laboratory of High Pressure and Superhard Materials, College of Physics, Jilin University , Changchun 130012,

J

Jishan Liu

Shanghai Synchrotron Radiation Facility

L

Lu Liu

Z

Zhongyuan Han

School of Integrated Circuits

K

Kexiong Zhang

School of Integrated Circuits Dalian University of Technology Dalian 116024 P. R. China

H

Hongwei Liang

School of Integrated Circuits

H

Hong Yin