Polarity and anti-distortive polarons in WO3 through epitaxial shear strain
Abstract
Abstract Bestowing complementary metal-oxide semiconductor-compatible binary oxides with additional functionalities is a powerful strategy toward the realization of oxide electronics. Ideal candidates are thin films which display a strong sensitivity to strain, chemical doping or nanoscale confinement. Among these, crystalline tungsten trioxide WO 3 exhibits exceptional structural flexibility, enabling a wide range of functionalities. Here we reveal the emergence of a polar phase in epitaxial WO 3 thin films. We accomplish this by imposing epitaxial shear strain, which stabilizes a low-symmetry triclinic structure that persists up to large film thicknesses and elevated temperatures. At the atomic scale, a change in the oxygen octahedral tilt pattern facilitates this symmetry lowering into a polar phase, which manifests as a periodic in-plane polarized stripe domain configuration with needle-like bifurcations at the microscale. The stripe domain walls further exhibit a strongly enhanced electrical conductivity in conjunction with a pronounced reduction of a distortive structural mode, providing experimental evidence for anti-distortive polaronic transport recently predicted in WO 3 .
Article Details
Authors (14)
Ewout van der Veer
Martin F. Sarott
Jack T. Eckstein
Stijn Feringa
Dennis van der Veen
Johanna van Gent González
Majid Ahmadi
Horatio R. J. Cox
Ellen M. Kiens
Gertjan Koster
Bart J. Kooi
Michael A. Carpenter
Ekhard K. H. Salje
Beatriz Noheda