Phototheranostic Sutures Integrated with NIR-II Emissive Photosensitizers for Postoperative Complication Prevention and Non-invasive Monitoring
Article Details
Journal Info
Journal of the American Chemical Society
American Chemical Society
Authors (9)
Junyi Cai
Guangdong Basic Research Center of Excellence for Aggregate Science, School of Science and Engineering
Shan He
Department of Chemistry, The Hong Kong Branch of Chinese National Engineering Research Center for Tissue Restoration and Reconstruction, State Key Laboratory of Nervous System Disorder, Division of Life Science, and Department of Chemical and Biological Engineering
Zhen Tian
Guangdong Basic Research Center of Excellence for Aggregate Science, School of Science and Engineering
Shibo Cheng
Guangdong Basic Research Center of Excellence for Aggregate Science, School of Science and Engineering
Lianrui Hu
Shanghai Engineering Research Center of Molecular Therapeutics and New Drug Development, Shanghai Frontiers Science Center of Molecule Intelligent Syntheses, School of Chemistry and Molecular Engineering
Dan Ding
Nanchang University , , ,
Huilin Xie
Nankai International Advanced Research Institute (Shenzhen Futian)
Jianquan Zhang
Guangdong Basic Research Center of Excellence for Aggregate Science, School of Science and Engineering
Ben Zhong Tang
School of Science and Engineering, Guangdong Basic Research Center of Excellence for Aggregate Science, The Chinese University of Hong Kong (Shenzhen), Longgang, Shenzhen 518172, Guangdong, P. R. China