Photoluminescence in single-layer MoS2: The role of impurities and doping

K Kaixiang Shu (Sorbonne Université, Muséum National d'Histoire Naturelle, UMR CNRS 7590, Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, IMPMC , 75005 Paris,) L Lam Nguyen Do (Sorbonne Université, Muséum National d’Histoire Naturelle, UMR CNRS 7590, IRD, Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, IMPMC 1 , 75005 Paris,) W Wei Gao J Johan Biscaras (Sorbonne Université, Muséum National d'Histoire Naturelle, UMR CNRS 7590, Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, IMPMC , 75005 Paris,) A Abhay Shukla (Sorbonne Université, Muséum National d'Histoire Naturelle, UMR CNRS 7590, Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, IMPMC , 75005 Paris,)

Abstract

Photoluminescence is an important property intervening in the efficiency and performance of single-layer MoS2 optoelectronic devices. The variation of photoluminescence with impurities related to the environment and the substrate and dependence on temperature, illumination, and doping can give information on the mechanisms involving trapped, bound, and free charges. In this work, we measure photoluminescence in exfoliated single-layer MoS2 on a variety of substrates and environments, as a function of temperature, gating, and laser power concluding that extrinsic impurities and defects are dominant as dopants and as trapping centers. Adsorbates from the environment act as electron acceptors and tend to reduce the intrinsically n-doped character of MoS2. On the other hand, an interaction between impurities on substrates, such as glass or silicon dioxide, leads to an increase in n-doping of MoS2 and creation of positively charged traps for excitons and free charge. We identify the doping and charge trapping mechanisms influencing photoluminescence and account for all observed behavior consistently.

Article Details

Volume / Issue Vol. 138, Issue 6
Published August 14, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (5)

K

Kaixiang Shu

Sorbonne Université, Muséum National d'Histoire Naturelle, UMR CNRS 7590, Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, IMPMC , 75005 Paris,

L

Lam Nguyen Do

Sorbonne Université, Muséum National d’Histoire Naturelle, UMR CNRS 7590, IRD, Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, IMPMC 1 , 75005 Paris,

W

Wei Gao

J

Johan Biscaras

Sorbonne Université, Muséum National d'Histoire Naturelle, UMR CNRS 7590, Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, IMPMC , 75005 Paris,

A

Abhay Shukla

Sorbonne Université, Muséum National d'Histoire Naturelle, UMR CNRS 7590, Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, IMPMC , 75005 Paris,