Photocracking of Polystyrene into Aromatic Products in CH <sub>2</sub> Cl <sub>2</sub>

K Kaiyi Su (Key Laboratory of Supramolecular Photochemistry &amp; CAS‐HKU Joint Laboratory on New Materials New Cornerstone Science Laboratory Technical Institute of Physics and Chemistry Chinese Academy of Sciences Beijing P.R. China) T Tengshijie Gao (Key Laboratory of Supramolecular Photochemistry &amp; CAS‐HKU Joint Laboratory on New Materials New Cornerstone Science Laboratory Technical Institute of Physics and Chemistry Chinese Academy of Sciences Beijing P.R. China) H Haixia Liu Z Zeyang Zhang Z Zhi‐Jun Li (Key Laboratory of Supramolecular Photochemistry &amp; CAS‐HKU Joint Laboratory on New Materials New Cornerstone Science Laboratory Technical Institute of Physics and Chemistry Chinese Academy of Sciences Beijing P.R. China) B Boxiang Liu M Min Jiang M Mingxuan Gao (Key Laboratory of Supramolecular Photochemistry &amp; CAS‐HKU Joint Laboratory on New Materials New Cornerstone Science Laboratory Technical Institute of Physics and Chemistry Chinese Academy of Sciences Beijing P.R. China) Z Zhiyuan Huang (The Molecular Foundry) C Chen‐Ho Tung (School of Chemistry and Chemical Engineering Shandong University Jinan China) L Li‐Zhu Wu (Key Laboratory of Photochemical Conversion and Optoelectronic Materials Technical Institute of Physics and Chemistry Chinese Academy of Sciences Beijing China)

Abstract

ABSTRACT Photocatalytic cracking of polystyrene (PS) into valuable aromatic chemicals presents a key route to plastic waste upcycling under mild conditions, in which CH 2 Cl 2 is often used as an inert solvent. Represented herein is to report an unexpected cracking of PS to C6‐C8 aromatic products in CH 2 Cl 2 without any additional photocatalysts under an O 2 atmosphere and 365‐415 nm irradiation. Remarkably, this photocatalyst‐free system achieves a maximum generation rate of 15.9 µmol/h for C6‐C8 aromatic products, competitive with state‐of‐the‐art systems that rely on external photocatalysts. Radical scavenging experiments and EPR spectra reveal that chlorine (Cl•) radicals generated from CH 2 Cl 2 under irradiation contribute to the cleavage of C─H/C─C bonds in PS, leading to the formation of C6‐C8 aromatic products. Under aerobic conditions, these Cl• radicals also promote the transformation of PS into carbonylated intermediates as the light‐absorbing species with an absorption range of 300‐500 nm, thereby accelerating the activation of PS and derivatives. Importantly, this work identifies, for the first time, CH 2 Cl 2 as a vital photochemical reagent in PS conversion to value‐added aromatics even under visible light irradiation.

Article Details

Volume / Issue Vol. 65, Issue 30
Published July 20, 2026
ISSN 1433-7851
Publisher Wiley

Journal Info

Angewandte Chemie International Edition

Wiley

ISSN: 1433-7851 Physical Sciences

Authors (11)

K

Kaiyi Su

Key Laboratory of Supramolecular Photochemistry &amp; CAS‐HKU Joint Laboratory on New Materials New Cornerstone Science Laboratory Technical Institute of Physics and Chemistry Chinese Academy of Sciences Beijing P.R. China

T

Tengshijie Gao

Key Laboratory of Supramolecular Photochemistry &amp; CAS‐HKU Joint Laboratory on New Materials New Cornerstone Science Laboratory Technical Institute of Physics and Chemistry Chinese Academy of Sciences Beijing P.R. China

H

Haixia Liu

Z

Zeyang Zhang

Z

Zhi‐Jun Li

Key Laboratory of Supramolecular Photochemistry &amp; CAS‐HKU Joint Laboratory on New Materials New Cornerstone Science Laboratory Technical Institute of Physics and Chemistry Chinese Academy of Sciences Beijing P.R. China

B

Boxiang Liu

M

Min Jiang

M

Mingxuan Gao

Key Laboratory of Supramolecular Photochemistry &amp; CAS‐HKU Joint Laboratory on New Materials New Cornerstone Science Laboratory Technical Institute of Physics and Chemistry Chinese Academy of Sciences Beijing P.R. China

Z

Zhiyuan Huang

The Molecular Foundry

C

Chen‐Ho Tung

School of Chemistry and Chemical Engineering Shandong University Jinan China

L

Li‐Zhu Wu

Key Laboratory of Photochemical Conversion and Optoelectronic Materials Technical Institute of Physics and Chemistry Chinese Academy of Sciences Beijing China