Photochemical N‐dealkylation of Tertiary Amines Coupled With Photocharging of Poly(Heptazine Imides)

J Jingru Zhuang (Department of Chemistry The Chinese University of Hong Kong Shatin Hong Kong China) Q Quanhao Zhang (State Key Laboratory of Physical Chemistry of Solid Surfaces Department of Chemistry and Chemical Engineering College of Chemistry and Chemical Engineering and Fujian Provincial Key Laboratory of Theoretical and Computational Chemistry Xiamen University Xiamen Fujian China) C Chong Wang T Tao Yao (National Synchrotron Radiation Laboratory, State Key Laboratory of Precision and Intelligent Chemistry, School of Nuclear Science and Technology) C Cheuk Lok Cheng (Department of Chemistry The Chinese University of Hong Kong Shatin Hong Kong China) P Pavlo O. Dral O Oleksandr Savateev

Abstract

ABSTRACT Photocharging in carbon nitride materials is emerging as a promising route for light‐driven energy storage, yet the nature of the storage sites and their mechanisms remain elusive. Here, we investigate photocharging in poly(heptazine imide) (PHI), focusing on its protonated (H‐PHI) and sodium (Na‐PHI) forms. Using the photochemical dealkylation of triethylamine, we quantify the density of electron–proton (e − /H + ) pairs stored in these materials and define a descriptor, N e : N hept , to track photocharging at the molecular level. H‐PHI demonstrates superior electron storage and reactivity, attributed to its microporous 2D structure and favorable energetics. Theoretical modeling, combined with spectroscopic analysis, reveals the nature of the active heptazine sites and their transformation during charging. The material retains its structural and functional integrity across multiple cycles, underscoring its stability and recyclability. These insights open new avenues for the rational design of carbon nitride‐based semiconductors for light‐induced redox applications.

Article Details

Volume / Issue Vol. 65, Issue 11
Published March 09, 2026
ISSN 1433-7851
Publisher Wiley

Journal Info

Angewandte Chemie International Edition

Wiley

ISSN: 1433-7851 Physical Sciences

Authors (7)

J

Jingru Zhuang

Department of Chemistry The Chinese University of Hong Kong Shatin Hong Kong China

Q

Quanhao Zhang

State Key Laboratory of Physical Chemistry of Solid Surfaces Department of Chemistry and Chemical Engineering College of Chemistry and Chemical Engineering and Fujian Provincial Key Laboratory of Theoretical and Computational Chemistry Xiamen University Xiamen Fujian China

C

Chong Wang

T

Tao Yao

National Synchrotron Radiation Laboratory, State Key Laboratory of Precision and Intelligent Chemistry, School of Nuclear Science and Technology

C

Cheuk Lok Cheng

Department of Chemistry The Chinese University of Hong Kong Shatin Hong Kong China

P

Pavlo O. Dral

O

Oleksandr Savateev