Persistent Boryl Radicals as Highly Reducing Photoredox Catalysts for Debrominative Borylations

J Jingjing Wu H Hui Wang H Huaquan Fang (School of Chemistry, University of Bristol, Cantock’s Close, Bristol BS8 1TS, U.K.) K Kevin C. Wang (School of Chemistry, University of Bristol, Cantock’s Close, Bristol BS8 1TS, U.K.) D Deborin Ghosh (School of Chemistry, University of Bristol, Cantock’s Close, Bristol BS8 1TS, U.K.) V Valerio Fasano (School of Chemistry, University of Bristol, Cantock’s Close, Bristol BS8 1TS, U.K.) A Adam Noble V Varinder K. Aggarwal

Article Details

Volume / Issue Vol. 147, Issue 23
Published June 11, 2025
Pages 19450-19457
ISSN 0002-7863
Publisher American Chemical Society

Journal Info

Journal of the American Chemical Society

American Chemical Society

ISSN: 0002-7863 Physical Sciences

Authors (8)

J

Jingjing Wu

H

Hui Wang

H

Huaquan Fang

School of Chemistry, University of Bristol, Cantock’s Close, Bristol BS8 1TS, U.K.

K

Kevin C. Wang

School of Chemistry, University of Bristol, Cantock’s Close, Bristol BS8 1TS, U.K.

D

Deborin Ghosh

School of Chemistry, University of Bristol, Cantock’s Close, Bristol BS8 1TS, U.K.

V

Valerio Fasano

School of Chemistry, University of Bristol, Cantock’s Close, Bristol BS8 1TS, U.K.

A

Adam Noble

V

Varinder K. Aggarwal