Path‐Decoupled Cation‐Eutaxy III–V van der Waals Memristive Semiconductors for Mitigating the Neuromorphic Accuracy‐Energy Trade‐off
Abstract
ABSTRACT Transistor‐based computing faces a fundamental energy‐resolution trade‐off: lowering the conductance reduces the programming energy (Eprog) but simultaneously narrows the dynamic range ( G max / G min ) required for multilevel state discrimination. A memristor offers analog programmability, but it suffers from the same limitation because reducing the conductance decreases G max / G min , degrading the learning accuracy. Here, a path‐decoupled III–V van der Waals (vdW) memtransistor overcomes this constraint via the spatial separation of the ionic and electronic transport pathways. Using H x K 1–x GaSb 2 , K + vacancies confined to the vdW gap serve as mobile ionic species, while holes conduct within the covalently bonded [GaSb 2 ] layers. This decoupling yields a high K + diffusivity and enables memristive switching at markedly reduced voltages. The memristive window G max / G min —which is set by ionic motion—remains invariant under gate modulation, whereas E prog decreases via electrostatic control of the channel conductance. Consequently, the synaptic plasticity and neuromorphic inference maintain a high accuracy (>80%), while E prog is reduced by more than an order of magnitude. The results establish ionic‐electronic path decoupling as a general strategy for breaking the accuracy‐energy trade‐off in emerging neuromorphic hardware and position III–V vdW materials, which are promising candidates for application in low‐energy, artificial intelligence accelerators.
Article Details
Authors (14)
Jihong Bae
Department of Materials Science and Engineering Yonsei University Seoul South Korea
Ji Hoon Han
Taeyoung Kim
Jongbum Won
Seokmin Park
Department of Materials Science and Engineering Yonsei University Seoul South Korea
Gyu Won Kim
Department of Materials Science and Engineering Yonsei University Seoul South Korea
Sungsoon Kim
Hong Choi
Department of Materials Science and Engineering Yonsei University Seoul South Korea
Taehoon Kim
Silklab, Department of Biomedical Engineering, Tufts University
Hong‐Sub Lee
Department of Materials Science & Engineering Kyung Hee University Yongin South Korea
Jae‐Hyun Lee
Department of Electrical and Computer Engineering Sungkyunkwan University Suwon Republic of Korea
Young Jin Choi
Department of Nanotechnology and Advanced Materials Engineering Hybrid Materials Research Center (HMC) Sejong University Seoul South Korea
Jinwoo Cheon
Center for Nanomedicine, Institute for Basic Science (IBS), Seoul 03722, Republic of Korea
Wooyoung Shim