Outside Back Cover: Atomically Precise Interfacial Engineering on Tin‐Silicon Oxo Clusters for Sub‐8 nm Lithography (Angew. Chem. Int. Ed. 16/2026)
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Authors (11)
Jian Wei
Ni Zhen
Institute of Modern Optics, College of Electronic Information and Optical Engineering
Zuohu Zhou
Institute of Modern Optics, College of Electronic Information and Optical Engineering
Fengbo Yan
School of Materials Science and Engineering Nankai University Tianjin P. R. China
Yang Xu
Fangfang Liu
Laboratory of Inflammation and Vaccines, Shenzhen Institutes of Advanced Technology
Aibing Yang
Institute of Modern Optics Tianjin Key Laboratory of Micro‐scale Optical Information Science and Technology Nankai University Tianjin P. R. China
Siming Qi
Institute of Modern Optics, College of Electronic Information and Optical Engineering
Zeqi Yu
Institute of Modern Optics Tianjin Key Laboratory of Micro‐scale Optical Information Science and Technology Nankai University Tianjin P. R. China
Jun Zhao
Department of Thoracic Oncology Beijing Cancer Hospital Beijing China
Lei Zhang