Origin of the inhomogeneous nanoscale resistivity in chromium doped V2O3

J Johannes Mohr Y Yudi Wang (Key Laboratory for the Physics and Chemistry of Nanodevices, School of Electronics) X Xiaoyu Xu (State Key Laboratory of Systems Medicine for Cancer, School of Biomedical Engineering, Institute of Medical Robotics and Shanghai Academy of Experimental Medicine, Shanghai Jiao Tong University) R Ruilin Wang D Dirk J. Wouters R Rainer Waser J Joyeeta Nag D Daniel Bedau

Abstract

Abstract Chromium doped V2O3 polycrystalline thin films typically consist of conductive grains separated by insulating grain boundaries. We investigate the origin of the spatially inhomogeneous resistivity in these films and find no qualitative differences between doped and undoped films, or for different oxygen stoichiometries. By a combination of conductive atomic force microscopy, high-resolution transmission electron microscopy and nanoscale elemental mapping, we show that the inhomogeneity is due to the formation of amorphous or poorly crystallized regions at the grain boundaries. Both the distribution of the dopants and the local oxygen stoichiometry appear to be very homogeneous, and therefore do not contribute to the inhomogeneous conductivity.

Article Details

Volume / Issue Vol. 15, Issue 1
Published May 06, 2025
ISSN 2045-2322
Publisher Nature Portfolio

Journal Info

Scientific Reports

Nature Portfolio

ISSN: 2045-2322 Open Access Life Sciences

Authors (8)

J

Johannes Mohr

Y

Yudi Wang

Key Laboratory for the Physics and Chemistry of Nanodevices, School of Electronics

X

Xiaoyu Xu

State Key Laboratory of Systems Medicine for Cancer, School of Biomedical Engineering, Institute of Medical Robotics and Shanghai Academy of Experimental Medicine, Shanghai Jiao Tong University

R

Ruilin Wang

D

Dirk J. Wouters

R

Rainer Waser

J

Joyeeta Nag

D

Daniel Bedau