Optimization of microwave absorption properties based on the construction of Ni–TiN heterojunctions

Q Qian Li G Guimei Shi (School of Science, Shenyang University of Technology 2 , Economic, Shenyang, Liaoning 110870,) N Nan Wang Q Qing Guo (School of Materials Science and Engineering, Henan Institute of Advanced Technology) M Mingqian Geng (Department of Materials Physics and Chemistry, School of Materials Science and Engineering and State Key Laboratory of Rolling and Automation, Northeastern University 3 , Shenyang, Liaoning 110819,) Y Yuxiang Dai (Department of Materials Physics and Chemistry, School of Materials Science and Engineering) Y Yang Qi B Bowen Zhang

Abstract

In this study, Ni–TiN@CN nanocapsules were successfully prepared by the DC arc method and the self-polymerization reaction of dopamine. The effect of material composition on their microwave absorbing properties was systematically investigated. The crystal structure, core–shell morphology, and the successful construction of the nitrogen-doped carbon layer of samples were confirmed by x-ray diffractometer, Raman spectroscopy, x-ray photoelectron spectroscopy, transmission electron microscopy, and scanning electron microscopy. The synergistic effect of the dielectric and magnetic losses is optimized by the introduction of Ni elements. Electromagnetic parameter tests show that the dielectric relaxation loss of the material is further significantly enhanced by the multi-interface heterostructure constructed after coating the nitrogen-doped carbon shell layer. Ni–TiN@CN nanocapsules have a reflection loss of −47.74 dB at a thickness of 2.6 mm and a combined effective absorption bandwidth (RL < −20 dB) of 4.5 GHz. It exhibits excellent microwave absorption performance. This study provides a new idea for the design of highly efficient microwave absorbing materials. It confirms that the construction of multi-interface heterostructures can effectively regulate the microwave absorbing properties of materials.

Article Details

Volume / Issue Vol. 163, Issue 6
Published August 14, 2025
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (8)

Q

Qian Li

G

Guimei Shi

School of Science, Shenyang University of Technology 2 , Economic, Shenyang, Liaoning 110870,

N

Nan Wang

Q

Qing Guo

School of Materials Science and Engineering, Henan Institute of Advanced Technology

M

Mingqian Geng

Department of Materials Physics and Chemistry, School of Materials Science and Engineering and State Key Laboratory of Rolling and Automation, Northeastern University 3 , Shenyang, Liaoning 110819,

Y

Yuxiang Dai

Department of Materials Physics and Chemistry, School of Materials Science and Engineering

Y

Yang Qi

B

Bowen Zhang