Optimization and stabilization of a compact laser-plasma EUV source based on pulsed Xe/He double-stream gas jets
Abstract
We present our progress of a compact laser-plasma extreme ultraviolet (EUV) source based on Xe/He double-stream gas jets irradiated by a 700-mJ Nd:YAG laser. The source was characterized using a flat-field spectrometer, an absolutely calibrated EUV energy meter, and a pinhole camera imaging system. A Maximum single-pulse EUV intensity of 2.36 mJ was achieved at 13.5 nm (2% bandwidth, 2π sr), corresponding to a conversion efficiency of 0.34%. Meanwhile, the plasma size was reduced to a length of 560 μm and a diameter of 160 μm when observed at a 90° angle relative to the laser. An intensity stability of 0.52% (1σ, 100-pulse window) was achieved over 3000 pulses when stabilizing the back pressure of the Xe gas with a pressure controller. This EUV source is applicable to various EUV metrology applications.
Article Details
Journal Info
Journal of Applied Physics
American Institute of Physics
Authors (5)
Yichi Yao
Department of Advanced Optical and Microelectronic Equipment, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , Shanghai 201800,
Boyu Wang
Center of Single-Molecule Sciences, Institute of Modern Optics, Frontiers Science Center for New Organic Matter, Tianjin Key Laboratory of Micro-scale Optical Information Science and Technology, College of Electronic Information and Optical Engineering, Nankai University, 38 Tongyan Road, Jinnan District, Tianjin 300350, P. R. China
Chengnan He
Department of Advanced Optical and Microelectronic Equipment, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , Shanghai 201800,
Wenhua Wang
Gang Xin