One‐Step Phosphine‐Oxide Post‐Modification of Multi‐Resonance Emitters for Efficient, Narrowband, Quenching‐Resistant OLEDs

L Lixiao Guo (State Key Laboratory of Supramolecular Structure and Materials College of Chemistry Jilin University Changchun People's Republic of China) W Weibo Cui (State Key Laboratory of Supramolecular Structure and Materials College of Chemistry Jilin University Changchun 130012 China) Y Yexuan Pu L Linjie Li (Key Laboratory of Pathogen Microbiology and Immunology, Institute of Microbiology, Chinese Academy of Sciences) Y Yuhan Sun (Center of Low-Carbon Conversion Science and Engineering) P Pingping Zheng C Chenglong Li (Department of Medicinal Chemistry, University of Florida, Gainesville, Florida 32610, United States) Y Yue Wang

Abstract

Abstract Multiple‐resonance thermally activated delayed fluorescence (MR‐TADF) materials featuring high efficiency and narrowband emission are crucial for wide color‐gamut organic light‐emitting diodes (OLEDs), but they often suffer from complex synthesis and limited structural diversity. In this study, we report a one‐step, metal‐free phosphine‐oxide (P═O) post‐modification strategy to construct the first B/N/P═O fused MR‐TADF emitters, PO‐BCzBN and PO‐tFBN. This strategy introduces a covalent P═O lock, enhancing the rigidity of the π‐conjugation plane to maintain narrowband emission while simultaneously suppressing aggregation‐caused quenching (ACQ) through the steric hindrance introduced by the trigonal pyramidal geometry of sp 3 ‐hybridized P atom. PO‐BCzBN and PO‐tFBN show photoluminescence emission peaks at 466 and 493 nm with narrow full widths at half maximum (FWHMs) of 21 and 23 nm in solution, near‐unity photoluminescence quantum yields of 98% and 99%, rapid reverse intersystem crossing rates of 2.0 × 10 4 and 2.1 × 10 4 s −1 , and suppressed concentration quenching in films. Sensitizer‐free OLEDs based on PO‐BCzBN and PO‐tFBN achieve maximum external quantum efficiencies of 21.6%–34.2% (electroluminescence emission peaks, λ EL s, = 472–476 nm, FWHMs = 24–28 nm) and 28.3%–35.8% ( λ EL s = 496–500 nm, FWHMs = 26–27 nm) across a broad doping range (1–20 wt%), respectively, demonstrating superior resistance to spectral broadening and ACQ.

Article Details

Volume / Issue Vol. 64, Issue 48
Published November 24, 2025
ISSN 1433-7851
Publisher Wiley

Journal Info

Angewandte Chemie International Edition

Wiley

ISSN: 1433-7851 Physical Sciences

Authors (8)

L

Lixiao Guo

State Key Laboratory of Supramolecular Structure and Materials College of Chemistry Jilin University Changchun People's Republic of China

W

Weibo Cui

State Key Laboratory of Supramolecular Structure and Materials College of Chemistry Jilin University Changchun 130012 China

Y

Yexuan Pu

L

Linjie Li

Key Laboratory of Pathogen Microbiology and Immunology, Institute of Microbiology, Chinese Academy of Sciences

Y

Yuhan Sun

Center of Low-Carbon Conversion Science and Engineering

P

Pingping Zheng

C

Chenglong Li

Department of Medicinal Chemistry, University of Florida, Gainesville, Florida 32610, United States

Y

Yue Wang