On the origin of hydrophilic interactions at alumina surfaces

V Venkata Surya Kumar Choutipalli (Institute for Computational Molecular Science, Temple University 1 , Philadelphia, Pennsylvania 19122,) M Michael L. Klein M Mark DelloStritto (Institute for Computational Molecular Science, Temple University , Philadelphia, Pennsylvania 19122,)

Abstract

Despite advances in understanding macroscopic wetting behavior, the atomistic mechanisms underlying hydrophilicity at solid–liquid interfaces remain only partially understood, particularly for chemically and structurally complex surfaces. Alumina, a widely used oxide in catalysis and surface coatings, exhibits such complexity due to the variability in surface termination and hydroxylation. In this study, we investigate the hydrophilicity of three crystallographic terminations of hydroxylated alumina—(0001), (1120), and (0112)–using molecular dynamics simulations based on neural network potential trained on density functional theory data. We quantify hydrophilicity through mean square displacement, density fluctuations, hydrogen bonding characteristics, vibrational density of states, the tetrahedral order parameter, and the contact angle. Our results reveal a clear hydrophilicity trend of (1120) < (0001) < (0112), with the relatively flat surface (1120) showing the least structured interfacial water and the corrugated surface (0112) showing the most pronounced confinement and hydrogen bonding. This trend is reflected in reduced water mobility, suppressed density fluctuations, stronger surface-to-water hydrogen bonds, and greater disruption of tetrahedral order near the (0112) interface. These findings demonstrate that atomic-scale surface roughness and the degree to which it can disrupt the structure of water are key to forming strong surface-to-water hydrogen bonds, thereby offering a microscopic rationale for hydrophilic behavior at oxide surfaces.

Article Details

Volume / Issue Vol. 163, Issue 19
Published November 21, 2025
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (3)

V

Venkata Surya Kumar Choutipalli

Institute for Computational Molecular Science, Temple University 1 , Philadelphia, Pennsylvania 19122,

M

Michael L. Klein

M

Mark DelloStritto

Institute for Computational Molecular Science, Temple University , Philadelphia, Pennsylvania 19122,