Nondestructive Patterning of Upconverting and Down‐Shifting Luminescent Nanoparticles for Information Encryption

L Liwei Dai S Siyu Yi (State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, Fudan University, Shanghai 200438, China) Z Zi‐Han Chen (Department of Chemistry, College of Smart Materials and Future Energy, New Cornerstone Science Laboratory, State Key Laboratory of Molecular Engineering of Polymers, Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials and Ichem Fudan University Shanghai P. R. China) X Xiancheng Zhang (State Key Laboratory of Molecular Engineering of Polymers Department of Macromolecular Science Shanghai Key Laboratory of Metasurfaces for Light Manipulation Department of Physics Fudan University Shanghai 200438 China) H Huibin He Y Yazi Wang (State Key Laboratory of Molecular Engineering of Polymers, Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Department of Macromolecular Science Fudan University Shanghai 200438 P.R. China) A Angang Dong (Department of Chemistry and Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, iChEM) F Fan Zhang X Xiangcheng Pan (State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, Fudan University, Shanghai 200438, China) Y Yutao Sang Z Zhihong Nie (Department of Macromolecule Science)

Abstract

Abstract Patterning luminescent colloidal nanoparticles (NPs) at the micro‐ and nanometer scale is crucial for their integration into advanced solid‐state optical, photonic, and electronic devices. However, it remains challenging to achieve high resolution and high fidelity in patterning chemically fragile luminescent NPs, while not sacrificing their structural integrity and/or optical properties. Here, we develop a rationally designed three‐armed diazo crosslinker ( 3G ) for nondestructively patterning various chemically sensitive luminescent NPs with high resolution (down to nanoscale) and high fidelity. The key points of the 3G design include (i) shielding aliphatic C─H bonds, (ii) extending the distance between active sites, and (iii) introducing more crosslinkable moieties. Thanks to the low UV exposure dose (18 mJ cm −2 , in stark contrast to 200–500 mJ cm −2 for diazirine‐based crosslinkers) required for sufficient crosslinking, mild photochemistry of 3G , and proper alignment of energy levels between 3G and NPs, the 3G ‐based patterning method can fully preserve the structural and photophysical properties of both upconverting NPs and perovskite quantum dots, as reflected by their unchanged emission peak/lifetime and high quantum yield retention (90%). Moreover, this method enables the fabrication of multi‐layer structures for dual‐mode anti‐counterfeiting. This work broadens the scope for patterning inorganic NPs, thereby facilitating their potential applications in system‐level devices.

Article Details

Volume / Issue Vol. 64, Issue 37
Published September 08, 2025
ISSN 1433-7851
Publisher Wiley

Journal Info

Angewandte Chemie International Edition

Wiley

ISSN: 1433-7851 Physical Sciences

Authors (11)

L

Liwei Dai

S

Siyu Yi

State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, Fudan University, Shanghai 200438, China

Z

Zi‐Han Chen

Department of Chemistry, College of Smart Materials and Future Energy, New Cornerstone Science Laboratory, State Key Laboratory of Molecular Engineering of Polymers, Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials and Ichem Fudan University Shanghai P. R. China

X

Xiancheng Zhang

State Key Laboratory of Molecular Engineering of Polymers Department of Macromolecular Science Shanghai Key Laboratory of Metasurfaces for Light Manipulation Department of Physics Fudan University Shanghai 200438 China

H

Huibin He

Y

Yazi Wang

State Key Laboratory of Molecular Engineering of Polymers, Shanghai Key Laboratory of Metasurfaces for Light Manipulation, Department of Macromolecular Science Fudan University Shanghai 200438 P.R. China

A

Angang Dong

Department of Chemistry and Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, iChEM

F

Fan Zhang

X

Xiangcheng Pan

State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, Fudan University, Shanghai 200438, China

Y

Yutao Sang

Z

Zhihong Nie

Department of Macromolecule Science