Natural van der Waals Canalization Lens for Non‐Destructive Nanoelectronic Circuit Imaging and Inspection (Adv. Mater. 32/2025)
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Authors (17)
Qingdong Ou
Macao Institute of Materials Science and Engineering (MIMSE) Sino‐Luso Joint Laboratory For Optoelectronics Macau University of Science and Technology Taipa Macao China
Shuwen Xue
School of Physical Science and Technology, Lingnan Normal University 3 , Zhanjiang 524048,
Weiliang Ma
Jiong Yang
Materials Genome Institute, State Key Laboratory of Advanced Refractories
Guangyuan Si
Melbourne Centre for Nanofabrication Victorian Node of the Australian National Fabrication Facility Clayton Victoria 3168 Australia
Lu Liu
Gang Zhong
Macao Institute of Materials Science and Engineering (MIMSE) Faculty of Innovation Engineering Macau University of Science and Technology Taipa Macao 999078 China
Jingying Liu
Macao Institute of Materials Science and Engineering (MIMSE) Faculty of Innovation Engineering Macau University of Science and Technology Taipa Macao 999078 China
Zongyuan Xie
Engineering Research Center of Nano‐Geomaterials of Ministry of Education Faculty of Materials Science and Chemistry China University of Geosciences Wuhan 430074 China
Ying Xiao
CIBM Center for Biomedical Imaging
Tian Sun
Ding Yuan
Kourosh Kalantar‐Zadeh
School of Chemical and Biomolecular Engineering The University of Sydney Sydney New South Wales Australia
Peining Li
Zhigao Dai
Huanyang Chen
Department of Physics, Xiamen University 1 , Xiamen 361005,
Qiaoliang Bao