Multifunctional control of oxide interface via surface-oxygen-vacancy engineering

Y Yanpeng Hong (School of Materials Science and Engineering, Xiangtan University 1 , Xiangtan 411105,) W Weijie Duan (School of Computational Science and Electronics, Hunan Institute of Engineering 2 , Xiangtan 411104,) M Ming Gao L Liupeng Wang C Changmin Xiong (School of Physics and Astronomy, Beijing Normal University 3 , Beijing 100875,) J Jiacai Nie (School of Physics and Astronomy, Beijing Normal University 3 , Beijing 100875,) X Xiangli Zhong (School of Materials Science and Engineering, Xiangtan University 1 , Xiangtan 411105,) J Jinbin Wang (Department of Agronomy, Purdue University)

Abstract

Interfacial properties of oxide heterostructures, such as LaAlO3 (LAO)/SrTiO3 (STO), are closely related to the surface physicochemical states, offering unprecedented avenues for device tuning. Herein, we demonstrate that surface oxygen vacancy engineering through amorphous-LAO capping layer enables multifunctional control of interfacial conductivity, Kondo physics, and Rashba spin–orbit coupling at LAO/STO (001). X-ray photoelectron spectroscopy and electrical transport measurements reveal that the formation of oxygen vacancies at the LAO surface triggers charge transfer and insulator-to-metal transition of LAO/STO, with its carrier density increasing from 0.55 × 1013 to 1.08 × 1013 cm−2 as the amorphous-LAO thickness grows. The low-temperature resistance upturn exhibits Kondo effect characteristics, with Kondo temperature rising from 10.88 to 35.11 K concomitantly, accompanied by a two-orders-of-magnitude reduction in Kondo resistance, reflecting the transition of Kondo scattering center from Cr to Ti. Magnetotransport further reveals the enhancement of Rashba spin–orbital coupling with Rashba spin splitting energy Eso increasing from 2.54 to 4.07 meV and signature of Elliott–Yafet spin relaxation mechanism (spin–orbital relaxation time τso ∝ elastic scattering time τel), suggesting Cr ions as possible spin–orbit scattering impurities.

Article Details

Volume / Issue Vol. 163, Issue 2
Published July 14, 2025
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (8)

Y

Yanpeng Hong

School of Materials Science and Engineering, Xiangtan University 1 , Xiangtan 411105,

W

Weijie Duan

School of Computational Science and Electronics, Hunan Institute of Engineering 2 , Xiangtan 411104,

M

Ming Gao

L

Liupeng Wang

C

Changmin Xiong

School of Physics and Astronomy, Beijing Normal University 3 , Beijing 100875,

J

Jiacai Nie

School of Physics and Astronomy, Beijing Normal University 3 , Beijing 100875,

X

Xiangli Zhong

School of Materials Science and Engineering, Xiangtan University 1 , Xiangtan 411105,

J

Jinbin Wang

Department of Agronomy, Purdue University