Microscopic evolution mechanism of streamer-like pulses in silicon needle corona discharge based on plasma chemistry

Y Yanyi Wang Z Zihan Yuan (International School of Information Science and Engineering) Y Yong Chen X Xueyang Bai M Minjie Li X Xuandong Liu (State Key Laboratory of Electrical Insulation and Power Equipment, School of Electrical Engineering, Xi’an Jiaotong University 1 , Shaanxi Xi’an,)

Abstract

Under negative DC corona with a silicon needle cathode, the discharge phenomenon differs markedly from that of metal electrodes, producing “streamer-like pulses” that exhibit significant randomness. To elucidate the formation mechanism, a two-dimensional axisymmetric pin–plate discharge model based on plasma chemical reactions was established to systematically investigate the kinetic processes and microscopic mechanisms of the silicon needle corona discharge. Compared with small-amplitude pulses, the formation of streamer-like pulses involves substantially higher electron density, electric field intensity, and ion density. The electron distribution is localized within 0.1 mm in front of the needle tip, with a pronounced electric field depression occurring in the region 0.01 − 0.1 mm from the tip. Ion composition analysis reveals that at the peak of small pulses, the dominant positive ions are O4+ and O2+, and negative ions are primarily O2−, whereas at the peak of streamer-like pulses, N4+ and O2+ become the dominant positive ions. Surface conductivity modulates the discharge mode: low conductivity gives large amplitude disparity, whereas high conductivity yields uniform pulses. Although photoionization is enhanced during streamer-like pulses, collisional ionization remains the main source of electron multiplication. This study reveals the synergistic regulation mechanism of silicon needle surface properties and space charge on discharge modes, providing a theoretical basis for understanding corona discharge behaviors on semiconductor electrodes.

Article Details

Volume / Issue Vol. 140, Issue 7
Published August 21, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (6)

Y

Yanyi Wang

Z

Zihan Yuan

International School of Information Science and Engineering

Y

Yong Chen

X

Xueyang Bai

M

Minjie Li

X

Xuandong Liu

State Key Laboratory of Electrical Insulation and Power Equipment, School of Electrical Engineering, Xi’an Jiaotong University 1 , Shaanxi Xi’an,