Metal Doping of Strongly Confined Halide Perovskite Nanocrystals under Ambient Conditions

Z Zachary A. VanOrman M Mateo Cárdenes Wuttig (Rowland Institute) A Antti-Pekka M. Reponen T Taek-Seung Kim (Rowland Institute at Harvard) C Claire E. Casaday (Department of Chemistry and Chemical Biology) D Dongtao Cui (Department of Chemistry and Chemical Biology) T Tejas Deshpande (Laboratory for Energy Materials, École Polytechnique Fédérale de Lausanne (EPFL), Rue de l’Industrie 17, 1951 Sion, Switzerland) H Huygen J. Jöbsis (Laboratory for Energy Materials, École Polytechnique Fédérale de Lausanne (EPFL), Rue de l’Industrie 17, 1951 Sion, Switzerland) P Pascal Schouwink (X-ray Diffraction and Surface Analytics Platform) E Emad Oveisi (Interdisciplinary Centre for Electron Microscopy (CIME)) A Aurélien Bornet (Nuclear Magnetic Resonance Platform (NMRP), Department of Chemical Sciences and Engineering) C Christian Reece (Rowland Institute at Harvard) S Sascha Feldmann

Article Details

Volume / Issue Vol. 147, Issue 19
Published May 14, 2025
Pages 16536-16544
ISSN 0002-7863
Publisher American Chemical Society

Journal Info

Journal of the American Chemical Society

American Chemical Society

ISSN: 0002-7863 Physical Sciences

Authors (13)

Z

Zachary A. VanOrman

M

Mateo Cárdenes Wuttig

Rowland Institute

A

Antti-Pekka M. Reponen

T

Taek-Seung Kim

Rowland Institute at Harvard

C

Claire E. Casaday

Department of Chemistry and Chemical Biology

D

Dongtao Cui

Department of Chemistry and Chemical Biology

T

Tejas Deshpande

Laboratory for Energy Materials, École Polytechnique Fédérale de Lausanne (EPFL), Rue de l’Industrie 17, 1951 Sion, Switzerland

H

Huygen J. Jöbsis

Laboratory for Energy Materials, École Polytechnique Fédérale de Lausanne (EPFL), Rue de l’Industrie 17, 1951 Sion, Switzerland

P

Pascal Schouwink

X-ray Diffraction and Surface Analytics Platform

E

Emad Oveisi

Interdisciplinary Centre for Electron Microscopy (CIME)

A

Aurélien Bornet

Nuclear Magnetic Resonance Platform (NMRP), Department of Chemical Sciences and Engineering

C

Christian Reece

Rowland Institute at Harvard

S

Sascha Feldmann