Mesoscale particle-based simulations of flow in expansion–contraction microchannels at low Reynolds number

T Tzortzis Koulaxizis (Department of Chemical and Biomolecular Engineering, University of Illinois Urbana-Champaign 1 , Urbana, Illinois 61801,) C Clara De La Torre Garcia (Department of Chemical Engineering, Auburn University 2 , Auburn, Alabama 36849,) C C. Levi Petix (Department of Chemical Engineering, Auburn University 2 , Auburn, Alabama 36849,) A Antonia Statt (Department of Materials Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign 2 , Urbana, Illinois 61801,) M Michael P. Howard (Department of Chemical Engineering, Auburn University 1 , Auburn, Alabama 36849,)

Abstract

We computationally study the flow of Newtonian fluids through sinusoidal expansion–contraction microchannels at low Reynolds numbers. We first use a perturbation method to analytically derive series solutions for the stream function and volumetric flow rate that extend prior work [Kitanidis and Dykaar, Transp. in Porous Media 26, 89–98 (1997)] up to tenth order. We then employ two particle-based mesoscale methods, dissipative particle dynamics (DPD) and multiparticle collision dynamics (MPCD), to simulate the same flows. We find that the fluid velocity at the expansion and contraction points, as well as the volumetric flow rate, are in good agreement between DPD, MPCD, and the fourth-order series solution for a wide range of microchannel geometries. The mesoscale fluid models exhibit some slip at the walls, leading to a small but consistent overprediction of the velocity and volumetric flow rate. The series solution fails for short microchannel lengths and large amplitudes; we identify lengths and amplitudes for which it converges to a given order. Overall, we find that DPD and MPCD are convenient and reasonably accurate methods, particularly for microchannel geometries where the series solution fails or is cumbersome to implement.

Article Details

Volume / Issue Vol. 163, Issue 19
Published November 21, 2025
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (5)

T

Tzortzis Koulaxizis

Department of Chemical and Biomolecular Engineering, University of Illinois Urbana-Champaign 1 , Urbana, Illinois 61801,

C

Clara De La Torre Garcia

Department of Chemical Engineering, Auburn University 2 , Auburn, Alabama 36849,

C

C. Levi Petix

Department of Chemical Engineering, Auburn University 2 , Auburn, Alabama 36849,

A

Antonia Statt

Department of Materials Science and Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign 2 , Urbana, Illinois 61801,

M

Michael P. Howard

Department of Chemical Engineering, Auburn University 1 , Auburn, Alabama 36849,