Mechanistic Atomic Hydrogen Chemistry for Ruthenium Deposition: From Ligand Elimination to Area-Selective Patterning

K Kyeongmin Min (Department of Materials Science and Engineering) C Chi Thang Nguyen (Department of Materials Science and Engineering) E Eun-Hyoung Cho (Advanced Device Platform) M Minhyeok Lee (Department of Materials Science and Engineering) W Wonjoong Kim (Department of Materials Science and Engineering) Y Youngmin Sunwoo (Graduate School of Semiconductor Materials and Devices Engineering) E Eunhyeok Heo (Graduate School of Semiconductor Materials and Devices Engineering) B Byungjo Kim (Graduate School of Semiconductor Materials and Devices Engineering) H Hao Van Bui (Phenikaa Institute for Advanced Study) H Han-Bo-Ram Lee (Department of Materials Science and Engineering)

Article Details

Volume / Issue Vol. 148, Issue 27
Published July 15, 2026
Pages 28484-28497
ISSN 0002-7863
Publisher American Chemical Society

Journal Info

Journal of the American Chemical Society

American Chemical Society

ISSN: 0002-7863 Physical Sciences

Authors (10)

K

Kyeongmin Min

Department of Materials Science and Engineering

C

Chi Thang Nguyen

Department of Materials Science and Engineering

E

Eun-Hyoung Cho

Advanced Device Platform

M

Minhyeok Lee

Department of Materials Science and Engineering

W

Wonjoong Kim

Department of Materials Science and Engineering

Y

Youngmin Sunwoo

Graduate School of Semiconductor Materials and Devices Engineering

E

Eunhyeok Heo

Graduate School of Semiconductor Materials and Devices Engineering

B

Byungjo Kim

Graduate School of Semiconductor Materials and Devices Engineering

H

Hao Van Bui

Phenikaa Institute for Advanced Study

H

Han-Bo-Ram Lee

Department of Materials Science and Engineering