Mechanistic Atomic Hydrogen Chemistry for Ruthenium Deposition: From Ligand Elimination to Area-Selective Patterning
K
Kyeongmin Min
(Department of Materials Science and Engineering)
C
Chi Thang Nguyen
(Department of Materials Science and Engineering)
E
Eun-Hyoung Cho
(Advanced Device Platform)
M
Minhyeok Lee
(Department of Materials Science and Engineering)
W
Wonjoong Kim
(Department of Materials Science and Engineering)
Y
Youngmin Sunwoo
(Graduate School of Semiconductor Materials and Devices Engineering)
E
Eunhyeok Heo
(Graduate School of Semiconductor Materials and Devices Engineering)
B
Byungjo Kim
(Graduate School of Semiconductor Materials and Devices Engineering)
H
Hao Van Bui
(Phenikaa Institute for Advanced Study)
H
Han-Bo-Ram Lee
(Department of Materials Science and Engineering)
Article Details
Volume / Issue
Vol. 148, Issue 27
Published
July 15, 2026
Pages
28484-28497
ISSN
0002-7863
Publisher
American Chemical Society
Journal Info
Journal of the American Chemical Society
American Chemical Society
ISSN: 0002-7863 Physical Sciences
Authors (10)
K
Kyeongmin Min
Department of Materials Science and Engineering
C
Chi Thang Nguyen
Department of Materials Science and Engineering
E
Eun-Hyoung Cho
Advanced Device Platform
M
Minhyeok Lee
Department of Materials Science and Engineering
W
Wonjoong Kim
Department of Materials Science and Engineering
Y
Youngmin Sunwoo
Graduate School of Semiconductor Materials and Devices Engineering
E
Eunhyeok Heo
Graduate School of Semiconductor Materials and Devices Engineering
B
Byungjo Kim
Graduate School of Semiconductor Materials and Devices Engineering
H
Hao Van Bui
Phenikaa Institute for Advanced Study
H
Han-Bo-Ram Lee
Department of Materials Science and Engineering
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