Manipulating Room Temperature Phosphorescence Stability of Photoactivated Materials for Multiplex Optical Applications

Y Yuteng Feng (State Key Laboratory of Flexible Electronics (LoFE) & Institute of Advanced Materials (IAM) School of Flexible Electronics (Future Technologies) Nanjing Tech University (NanjingTech) Nanjing 211816 China) H He Wang M Meng Zhang C Chao Huang J Ju Wang (State Key Laboratory for Crop Stress Resistance and High-Efficiency Production, College of Life Sciences, Northwest A&F University) L Lu Liu H Huiling Mao (State Key Laboratory of Flexible Electronics (LoFE) & Institute of Advanced Materials (IAM) School of Flexible Electronics (Future Technologies) Nanjing Tech University (NanjingTech) Nanjing China) Y Yue Feng C Chenxiao Li (State Key Laboratory of Flexible Electronics (LoFE) & Institute of Advanced Materials (IAM) School of Flexible Electronics (Future Technologies) Nanjing Tech University (NanjingTech) Nanjing 211816 China) M Meijuan Ding (State Key Laboratory of Flexible Electronics (LoFE) & Institute of Advanced Materials (IAM), School of Flexible Electronics (Future Technologies)) W Wei Huang Z Zhongfu An (State Key Laboratory of Flexible Electronics (LoFE) & Institute of Advanced Materials (IAM), School of Flexible Electronics (Future Technologies))

Abstract

ABSTRACT Photoactivated organic phosphorescent materials have emerged as promising candidates for optoelectronic applications due to their unique combination of remote controllability and dynamic response characteristics. Despite being a critical parameter governing their practical applicability, the photostability of these phosphorescent materials, particularly under prolonged illumination conditions, has not been systematically investigated to date. Here, we present a series of organic phosphorescent materials exhibiting dynamically tunable room‐temperature phosphorescence (RTP) stability under continuous irradiation. These materials show RTP activation upon initial excitation, followed by significant emission attenuation during sustained exposure. Mechanistic studies reveal that the RTP attenuation is attributed to singlet oxygen‐mediated oxidative damage to the phosphorescent chromophores. Through strategic incorporation of antioxidant stabilizers, we achieve remarkable photostability, maintaining 96% of maximum phosphorescence intensity after continuous irradiation for 1500 s. These findings not only elucidate fundamental photo‐stabilization mechanisms of dynamic RTP but also provide a feasible approach for developing stable phosphorescent materials for advanced optoelectronic applications.

Article Details

Volume / Issue Vol. 38, Issue 17
Published March 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (12)

Y

Yuteng Feng

State Key Laboratory of Flexible Electronics (LoFE) & Institute of Advanced Materials (IAM) School of Flexible Electronics (Future Technologies) Nanjing Tech University (NanjingTech) Nanjing 211816 China

H

He Wang

M

Meng Zhang

C

Chao Huang

J

Ju Wang

State Key Laboratory for Crop Stress Resistance and High-Efficiency Production, College of Life Sciences, Northwest A&F University

L

Lu Liu

H

Huiling Mao

State Key Laboratory of Flexible Electronics (LoFE) & Institute of Advanced Materials (IAM) School of Flexible Electronics (Future Technologies) Nanjing Tech University (NanjingTech) Nanjing China

Y

Yue Feng

C

Chenxiao Li

State Key Laboratory of Flexible Electronics (LoFE) & Institute of Advanced Materials (IAM) School of Flexible Electronics (Future Technologies) Nanjing Tech University (NanjingTech) Nanjing 211816 China

M

Meijuan Ding

State Key Laboratory of Flexible Electronics (LoFE) & Institute of Advanced Materials (IAM), School of Flexible Electronics (Future Technologies)

W

Wei Huang

Z

Zhongfu An

State Key Laboratory of Flexible Electronics (LoFE) & Institute of Advanced Materials (IAM), School of Flexible Electronics (Future Technologies)