Low through-plane thermal conductivity in amorphous HfO2/SiO2 nanolaminates
Abstract
Accurate knowledge of thermal transport in amorphous oxides is essential for effective thermal management in advanced semiconductor and cryogenic electronic devices. In this work, we investigate the through-plane thermal conductivity (κz) of amorphous HfO2/SiO2 nanolaminates fabricated by atomic layer deposition across the temperature range from 30 to 315 K. These multilayers serve as a model system for studying heat transport in amorphous thin films, where interfacial effects may significantly influence thermal conduction. Thermal conductivities were determined using the differential 3ω method and analyzed within the framework of the heat equation. A composite model combining the minimum thermal conductivity approach for the individual amorphous layers with the diffuse mismatch model for interfacial effects quantitatively reproduces the experimental data. The multilayers exhibit low thermal conductivities of 0.77±0.08 and 0.050±0.0015Wm−1K−1 at 300 and 30 K, respectively.
Article Details
Journal Info
Journal of Applied Physics
American Institute of Physics
Authors (12)
Felix Mende
Fraunhofer Institute for Photonic Microsystems IPMS (Center Nanoelectronic Technologies, CNT) 1 , 01109 Dresden,
Oliver Ostien
Fraunhofer Institute for Photonic Microsystems IPMS (Center Nanoelectronic Technologies, CNT) 1 , 01109 Dresden,
Fred Schöne
Fraunhofer Institute for Photonic Microsystems IPMS (Center Nanoelectronic Technologies, CNT) 1 , 01109 Dresden,
Roman Potjan
Fraunhofer Institute for Photonic Microsystems (IPMS), Center Nanoelectronic Technologies (CNT) 2 , 01109 Dresden,
Isabelle V. Sprave
JARA-FIT Institute for Quantum Information, Forschungszentrum Jülich GmbH and RWTH Aachen University 3 , 52074 Aachen,
Denny Dütz
JARA-FIT Institute for Quantum Information, Forschungszentrum Jülich GmbH and RWTH Aachen University 3 , 52074 Aachen,
Jan Frede
Institute of Applied Physics, TU Dresden 2 , Nöthnitzer Strasse 61, 01187 Dresden,
Tommy Meier
Institute of Applied Physics, TU Dresden 2 , Nöthnitzer Strasse 61, 01187 Dresden,
Hans Kleemann
Marcus Wislicenus
Fraunhofer Institute for Photonic Microsystems (IPMS), Center Nanoelectronic Technologies (CNT) 2 , 01109 Dresden,
Benjamin Lilienthal-Uhlig
Fraunhofer Institute for Photonic Microsystems IPMS (Center Nanoelectronic Technologies, CNT) 1 , 01109 Dresden,
Lukas M. Eng