Low-index and thin-film material characterization in the terahertz range via dielectric waveguide evanescent-field interaction

A Ashish Kumar H Hossein Rasekhmanesh (Leapwave Technology 2 , 28919 Leganés, Madrid,) A Asrin Piroutiniya (Leapwave Technology 2 , 28919 Leganés, Madrid,) D Daniel C. Gallego (Leapwave Technology 2 , 28919 Leganés, Madrid,) D Daniel Headland (3 Terahertz Engineering Laboratory, The University of Adelaide, Adelaide, SA 5005, Australia) M Muhsin Ali (Leapwave Technology 2 , 28919 Leganés, Madrid,) G Guillermo Carpintero (1 Optoelectronics and Laser Technology Group, Department of Electronics Technology, Universidad Carlos III de Madrid, 28911 Leganés, Madrid, Spain)

Abstract

Terahertz (THz) and millimeter-wave (mmW) spectroscopy provide non-ionizing, label-free access to the electromagnetic response of a wide range of materials, enabling applications in quality control, biomedical diagnostics, and non-destructive evaluation. Conventional free-space THz spectroscopy, however, often suffers from limited interaction length and reduced sensitivity when the sample is thin, spatially localized, available only in small volume, or incompatible with beam-based fixtures. In this work, we present an integrated, non-contact approach for broadband material-property extraction based on the evanescent field of a low-loss high-resistivity silicon dielectric waveguide. The material under test (MUT) is placed in the cladding region, where it perturbs the guided-mode propagation constant and attenuation. By measuring the complex transmission through a reference waveguide and a waveguide loaded with the MUT and by combining these data with mode simulations and a perturbation-based inversion, we extract the complex permittivity over a continuous frequency band. The approach leverages an evanescent-field-based non-destructive method, a compact measurement setup, and feasibility to rescale toward higher frequencies for broadband material screening in the mmW to THz range.

Article Details

Volume / Issue Vol. 140, Issue 4
Published July 28, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (7)

A

Ashish Kumar

H

Hossein Rasekhmanesh

Leapwave Technology 2 , 28919 Leganés, Madrid,

A

Asrin Piroutiniya

Leapwave Technology 2 , 28919 Leganés, Madrid,

D

Daniel C. Gallego

Leapwave Technology 2 , 28919 Leganés, Madrid,

D

Daniel Headland

3 Terahertz Engineering Laboratory, The University of Adelaide, Adelaide, SA 5005, Australia

M

Muhsin Ali

Leapwave Technology 2 , 28919 Leganés, Madrid,

G

Guillermo Carpintero

1 Optoelectronics and Laser Technology Group, Department of Electronics Technology, Universidad Carlos III de Madrid, 28911 Leganés, Madrid, Spain