Light-induced fine-tuning of optical cavities for organic optoelectronic devices
Abstract
Abstract Precise structural control is essential for high-performance semiconductors. In organic electronics, traditional methods for tuning the dimensions of device structures often rely on cumbersome, limited-resolution processes such as shadow mask patterning, printing, or viscosity tuning. Here, we report ultraviolet (UV) irradiation in ambient conditions as a transformative approach for tuning structural parameters of organic small molecule hole transport layers (HTLs) in vertical and lateral directions. The method preserves HTL conductivity while facilitating uniform thickness reduction through synergistic photo-induced oligomerization and photo-oxidative layer shrinking. Controlled thinning applies to various organic materials. In cavity architectures, UV-treated organic photodetectors show narrowband detection from 900 to 1200 nm with a full width at half maximum down to 25 nm, and UV-treated organic light-emitting diodes exhibit 75 nm peak tunability. Moreover, this strategy permits micrometer-scale lateral patterning of HTLs. Our work opens new opportunities for precise and practical engineering for organic electronic devices.
Article Details
Authors (24)
Shen Xing
Eva Bittrich
Leibniz-Institut für Polymerforschung Dresden e.V. 1 , Hohe Straße 6, 01069 Dresden,
Vasiliki Prifti
Stephanie Buchholtz
Yuan Liu
Louis Conrad Winkler
Maximilian F. X. Dorfner
Department of Chemistry, TUM School of Natural Sciences
Mikhail Malanin
Mingchao Wang
Max Planck Institute of Microstructure Physics
Guoqin Liu
Faculty of Chemistry and Food Chemistry & Center for Advancing Electronics Dresden (CFAED)
Dinara Samigullina
Anna-Lena Hofmann
Jakob Wolansky
Jörn Vahland
Tianyi Zhang
Rongjuan Huang
Samuel Dominic Seddon
Dieter Fischer
Sebastian Reineke
Frank Ortmann
Department of Chemistry, TUM School of Natural Sciences and Atomistic Modeling Center, Munich Data Science Institute, Technische Universität München (TUM), Lichtenbergstr. 4, 85748 Garching, Germany
Xinliang Feng
Hans Kleemann
Johannes Benduhn
Karl Leo