Ligand‐Mediated Shape Engineering of SWIR InAs Colloidal Quantum Dots for Photodetector Applications

T Taewan Kim (Department of Chemistry) J Jae Taek Oh (ICFO–Insitut De Ciències Fotòniques The Barcelona Institute of Science and Technology Castelldefels Barcelona Spain) H Hao Wu M Marta Martos Valverde (ICFO–Insitut De Ciències Fotòniques The Barcelona Institute of Science and Technology Castelldefels Barcelona Spain) D Debranjan Mandal G Gerasimos Konstantatos

Abstract

ABSTRACT Indium arsenide colloidal quantum dots (InAs CQDs) are promising candidates for next‐generation short‐wave infrared (SWIR) optoelectronics; however, synthesis using non‐pyrophoric amino‐arsine precursors has faced limitations in reaching long wavelengths (>1300 nm) due to intrinsic growth stagnation and challenging surface control. Herein, we report a robust strategy to synthesize high‐quality SWIR InAs CQDs by introducing bulky oleic acid (OA) ligands to overcome these kinetic barriers. By modulating the interplay between the steric hindrance of OA ligands and the stabilization of (111) facets, we induce a controlled shape evolution from initial kinetically stabilized spheres to thermodynamically stable tetrahedrons. This morphological transition enables the achievement of the same absorption wavelength followed by a nearly fourfold reduction in nanocrystal volume compared to spherical counterparts. This mechanism offers a distinct pathway for the bandgap tunability of InAs CQDs enabling access to the SWIR region (>1700 nm) under mild reaction conditions (260–280°C). Furthermore, the OA‐mediated surface chemistry unlocks the formulation of conductive halide‐based inks, enabling photodetector development based on amino‐arsine‐synthesized InAs CQDs extending their spectral coverage to 1.6 um. The resulting photodetectors exhibit an external quantum efficiency of 19.1% at 1300 nm and D * of 3.4 × 10 10 Jones.

Article Details

Volume / Issue Vol. 38, Issue 46
Published August 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (6)

T

Taewan Kim

Department of Chemistry

J

Jae Taek Oh

ICFO–Insitut De Ciències Fotòniques The Barcelona Institute of Science and Technology Castelldefels Barcelona Spain

H

Hao Wu

M

Marta Martos Valverde

ICFO–Insitut De Ciències Fotòniques The Barcelona Institute of Science and Technology Castelldefels Barcelona Spain

D

Debranjan Mandal

G

Gerasimos Konstantatos