Introducing Steric Bulk Into Silylboranes: Enhanced Bench Stability and Novel Chemical Reactivity

R Rikuro Takahashi (Division of Applied Chemistry, Graduate School of Engineering Hokkaido University Sapporo Hokkaido 060‐8628 Japan) J Julong Jiang (Institute for Chemical Reaction Design and Discovery (WPI-ICReDD)) S Satoshi Maeda (Institute for Chemical Reaction Design and Discovery (WPI-ICReDD)) H Hajime Ito (Division of Applied Chemistry, Graduate School of Engineering)

Abstract

Abstract Silylboranes are versatile intermediates in organic synthesis, and a wide range of structural variants of silylboranes have already been synthesized. However, the stability of silylboranes varies significantly, and their decomposition mechanism remains to be fully understood. Moreover, some silylborane motifs have not yet been applied as synthetic reagents due to their instability. To address this issue, we first investigated the decomposition mechanism of silylboranes in air and moisture using experimental and theoretical methods. We discovered that oxygenation by atmospheric oxygen is the major decomposition pathway, resulting in the formation of a borylsilylether, and that the introduction of a bulky silyl group suppresses this decomposition. Based on these results, we synthesized triisopropylsilyldimesitylborane ( i‐ Pr 3 Si–BMes 2 ), which exhibits high bench stability. Moreover, i‐ Pr 3 Si–BMes 2 reacts with carbon monoxide (CO), which is the first example of a reaction between a silylborane and CO. Further computational studies revealed that electronic effects, including hyperconjugation between the Si─B σ‐bond and C─O π*‐bond, are crucial for CO activation. Furthermore, we prepared a bench‐stable bissilylaminoborane by introducing triisopropylsilyl groups, providing a bissilylchloroborane upon hydrogen chloride treatment. These findings provide valuable insights into how steric and electronic effects can be used to optimize the balance between stability and reactivity in silylboranes.

Article Details

Volume / Issue Vol. 64, Issue 34
Published August 18, 2025
ISSN 1433-7851
Publisher Wiley

Journal Info

Angewandte Chemie International Edition

Wiley

ISSN: 1433-7851 Physical Sciences

Authors (4)

R

Rikuro Takahashi

Division of Applied Chemistry, Graduate School of Engineering Hokkaido University Sapporo Hokkaido 060‐8628 Japan

J

Julong Jiang

Institute for Chemical Reaction Design and Discovery (WPI-ICReDD)

S

Satoshi Maeda

Institute for Chemical Reaction Design and Discovery (WPI-ICReDD)

H

Hajime Ito

Division of Applied Chemistry, Graduate School of Engineering