Intrinsic structural factors and solvent effects on excited-state dynamics and photophysical properties of BIDP derivatives with dual-ESIPT units

G Guoqing Liu (School of Physics and Astronomy, Shanghai Jiao Tong University) X Xiaoxue Wu Y Yong Ding (School of Materials Science and Engineering)

Abstract

When multiple excited-state intramolecular proton transfer (ESIPT) units are incorporated into a molecule, the excited-state dynamics become more complex and sensitive to both intrinsic structure and solvent environment. However, a systematic understanding of how intrinsic and extrinsic factors regulate these dynamics remains unclear. Herein, quantum-chemical calculations were performed to elucidate the effects of the number of ESIPT units, coupling position, symmetry, and solvent polarity on the photochemical behavior and photophysical properties of BIDP derivatives with dual-ESIPT units. The results show that structural symmetry alteration can significantly change H-bond strength and ESIPT efficiency, compared with other intrinsic factors. Topological analysis of the electron localization function along proton-transfer channels offers mechanistic insights into the reduction in proton-transfer barriers for excited-state molecules with mirror-symmetric structures. The DLPNO-STEOM-CCSD method enables accurate assessment of energies in different electronic states for the keto tautomer. Furthermore, calculated radiative and nonradiative decay rate constants support that emission from keto-form BIDP derivatives exhibits anti-Kasha characteristics. In addition, high-polarity solvents impede the ESIPT process by preferentially stabilizing the more polar enol structures compared with the corresponding transition state structures. We expect that this theoretical work will provide valuable insights into the design and development of photochromic materials featuring dual ESIPT units.

Article Details

Volume / Issue Vol. 164, Issue 23
Published June 21, 2026
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (3)

G

Guoqing Liu

School of Physics and Astronomy, Shanghai Jiao Tong University

X

Xiaoxue Wu

Y

Yong Ding

School of Materials Science and Engineering