InGaN green laser diodes with grade p-AlGaN cladding layer

F Fangzhi Li (Key Laboratory of Semiconductor Display Materials and Chips, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences 1 , Suzhou, Jiangsu 215123,) S Si Wu J Jianping Liu A Aiqin Tian (Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences 2 , Suzhou 215123,) L Lingrong Jiang (Key Laboratory of Semiconductor Display Materials and Chips, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences 1 , Suzhou, Jiangsu 215123,) Z Zengcheng Li (Suzhou Ganbright Optoelectronic Technology Co., Ltd 5 ., Suzhou 215153,) Y Yaqin Li X Xuan Li (Department of Chemistry) H Hui Yang

Abstract

Distributed polarization-doped (DPD) AlGaN cladding layer (CL) has been successfully used in AlGaN ultraviolet laser diodes (LDs), which overcomes the problem of low Mg doping efficiency and can reduce the internal loss of LDs. However, this graded AlGaN CL is rarely used in InGaN visible LDs. Our previous work reported green LDs with DPD AlGaN CL, which can reduce the threshold current density of LDs, but suffer from the problem of low slope efficiency, only 0.07 W/A. Therefore, LDs with different structures were analyzed by optical field and device simulation. It was found that the electron blocking layer (EBL) in the LD structure is necessary to hinder electron leakage, even if a graded AlGaN CL with a high initial Al composition is used. By adopting an EBL, the slope efficiency of LDs with DPD AlGaN CL increased to 0.54 W/A, while the threshold current density was only slightly increased and the operating voltage was significantly reduced, compared with our previous report. These green LDs with DPD AlGaN CL also show a better performance than traditional green LDs.

Article Details

Volume / Issue Vol. 139, Issue 3
Published January 21, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (9)

F

Fangzhi Li

Key Laboratory of Semiconductor Display Materials and Chips, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences 1 , Suzhou, Jiangsu 215123,

S

Si Wu

J

Jianping Liu

A

Aiqin Tian

Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences 2 , Suzhou 215123,

L

Lingrong Jiang

Key Laboratory of Semiconductor Display Materials and Chips, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences 1 , Suzhou, Jiangsu 215123,

Z

Zengcheng Li

Suzhou Ganbright Optoelectronic Technology Co., Ltd 5 ., Suzhou 215153,

Y

Yaqin Li

X

Xuan Li

Department of Chemistry

H

Hui Yang