Influence of Sc, Y, and B dopants on structural distortions and polarization switching in AlN-based ferroelectrics
Abstract
Doped aluminum nitride (AlN) ferroelectrics exhibit a unique combination of high coercive fields and large remanent polarization, offering strong potential for enabling high-performance ferroelectric memory devices. Common dopants such as Sc, Y, and B have been widely used, but how they affect structural distortion, spontaneous polarization, and the polarization switching process remains insufficiently studied. This motivates our comparative first-principles study of Sc-, Y-, and B-doped AlN. Structural stability analyses reveal that, as the doping level increases, Sc- and Y-doped systems tend to undergo a phase transition from the polar wurtzite phase to the non-polar hexagonal phase, accompanied by a reduction in spontaneous polarization. In contrast, B-doped systems maintain an increasing polarization across the doping range. Nudged Elastic Band (NEB) calculations uncover an individual polarization switching model mediated by a β-BeO-like intermediate phase, distinct from conventional collective switching models, and enable lower polarization switching barriers. Specifically, YxAl1−xN alloys exhibit lower polarization switching barriers than their Sc-doped counterparts at low doping concentrations (x), whereas Sc-doped systems become more favorable in terms of switching barrier at higher x. BxAl1−xN displays a significant change in switching barrier across doping concentrations. These results indicate that Sc and B doping enable tunable coercive fields through precise control of doping concentrations, whereas Y doping leads to more stable coercive fields across different concentration levels. The discovery of β-BeO-mediated switching deepens the understanding of wurtzite ferroelectric polarization mechanisms and provides strategic guidelines for designing III-nitride-based nonvolatile memory devices through targeted doping engineering.
Article Details
Journal Info
Journal of Applied Physics
American Institute of Physics
Authors (10)
Xun Yu
State Key Laboratory of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing,
Chuanli Zhang
State Key Laboratory of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing,
Ruifeng Tang
State Key Laboratory of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics of the Chinese Academy of Sciences 1 , Beijing,
Xiao Long
Yuan Wang
Tiancheng Gong
Yang Yang
Pengfei Jiang
School of Life Sciences, The National Engineering Laboratory of Crop Resistance Breeding, Anhui Agricultural University
Wei Wei
Qing Luo