Induction of large in-plane uniaxial magnetic anisotropy for Co–Fe–B–Pt thin films by magnetic field annealing

T Takumi Yamazaki (Institute for Materials Research, Tohoku University 1 , Sendai 980-8577,) Y Yugo Ishitani (Advanced Products Development Center, Technology and Intellectual Property HQ, TDK Corporation 2 , Ichikawa 272-8558,) K Katsuyuki Nakada (Advanced Products Development Center, Technology and Intellectual Property HQ, TDK Corporation 2 , Ichikawa 272-8558,) T Tomoyuki Sasaki (Advanced Products Development Center, Technology and Intellectual Property HQ, TDK Corporation 2 , Ichikawa 272-8558,) Y Yasushi Endo (Department of Electrical Engineering, Graduate School of Engineering, Tohoku University 3 , Sendai 980-8579,) K Koki Takanashi (Institute for Materials Research, Tohoku University 3 , Sendai 980-8577,) T Takeshi Seki

Abstract

We report the induction of large in-plane uniaxial magnetic anisotropy for the CoFeB-based thin films by post-annealing under the magnetic field application. The comprehensive study reveals the influence of CoFeB composition and Pt addition to CoFeB on the induced magnetic anisotropy by magnetic field annealing. The addition of Pt to a CoFeB film significantly enhances the effect of magnetic field annealing, and as a result, the CoFeB–Pt films exhibit the in-plane uniaxial magnetic anisotropy energies that are one order of magnitude larger than the pristine CoFeB films. In order to understand the mechanism of magnetic anisotropy induction by post-annealing, we carried out the magnetostriction measurement for the CoFeB-based thin films. The correlation between the induced magnetic anisotropy and magnetoelastic properties is discussed.

Article Details

Volume / Issue Vol. 138, Issue 23
Published December 21, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (7)

T

Takumi Yamazaki

Institute for Materials Research, Tohoku University 1 , Sendai 980-8577,

Y

Yugo Ishitani

Advanced Products Development Center, Technology and Intellectual Property HQ, TDK Corporation 2 , Ichikawa 272-8558,

K

Katsuyuki Nakada

Advanced Products Development Center, Technology and Intellectual Property HQ, TDK Corporation 2 , Ichikawa 272-8558,

T

Tomoyuki Sasaki

Advanced Products Development Center, Technology and Intellectual Property HQ, TDK Corporation 2 , Ichikawa 272-8558,

Y

Yasushi Endo

Department of Electrical Engineering, Graduate School of Engineering, Tohoku University 3 , Sendai 980-8579,

K

Koki Takanashi

Institute for Materials Research, Tohoku University 3 , Sendai 980-8577,

T

Takeshi Seki