Improving electrical contact of vertically aligned carbon nanotubes with bonding metals in thermocompression bonding through oxygen plasma treatment

J Jianping Zou R Rongtao Jiang (CINTRA IRL 3288, CNRS NTU THALES, Nanyang Technological University 1 , 637553) C Chong Wei Tan (NTI-NTU Corporate Laboratory, Nanyang Technological University 3 , 637662) D Dominique Baillargeat (CNRS@CREATE Ltd 4 , 1 CREATE Way, CREATE Tower, 138602) P Philippe Coquet (CINTRA IRL 3288, CNRS NTU THALES, Nanyang Technological University 1 , 637553) B Beng Kang Tay

Abstract

Vertically aligned carbon nanotubes (VACNTs) are being widely studied due to their exceptional mechanical, electrical, and thermal properties. The application of thermocompression bonding (TCB) technique has positioned VACNTs as promising candidates for 3D heterogeneous integration, interconnects, and nanopackaging. However, challenges arise from a CNT-cluster layer covering the top surface of the as-grown VACNTs, adversely affecting wettability and electrical contact between the VACNTs and the bonding metals used in the TCB process. To mitigate this issue, we propose using oxygen plasma reactive ion etching (RIE) to treat the top and/or bottom surfaces of the VACNTs. Scanning electron microscopy and Raman spectroscopy characterizations confirm the successful removal of the CNT-cluster layer from the top surface following the RIE treatment, and excessive RIE treatment may cause partial damage to the graphitic structures of the VACNT surface. Direct-current measurements on fabricated VACNT wall π-bridge structures further validate the enhancement in electrical contact between the top surface-treated VACNTs and the bonding metals. This improvement is attributed to the effective removal of the CNT-cluster layer and the relative minimal damage to the graphitic structures, particularly in comparison to the bottom surface-treated VACNTs.

Article Details

Volume / Issue Vol. 138, Issue 10
Published September 14, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (6)

J

Jianping Zou

R

Rongtao Jiang

CINTRA IRL 3288, CNRS NTU THALES, Nanyang Technological University 1 , 637553

C

Chong Wei Tan

NTI-NTU Corporate Laboratory, Nanyang Technological University 3 , 637662

D

Dominique Baillargeat

CNRS@CREATE Ltd 4 , 1 CREATE Way, CREATE Tower, 138602

P

Philippe Coquet

CINTRA IRL 3288, CNRS NTU THALES, Nanyang Technological University 1 , 637553

B

Beng Kang Tay