Improved Facet and Edge Passivation in Near‐Infrared III‐V Colloidal Quantum Dot Photodetectors

P Pan Xia S Sasa Wang (College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology) Nanjing University of Posts and Telecommunications 9 Wenyuan Road Nanjing 210023 China) Y Yiqing Chen (Department of Chemistry) A Ahmet Gulsaran (Waterloo Institute for Nanotechnology, Department of Mechanical and Mechatronics Engineering University of Waterloo 200 University Ave W Waterloo Ontario N2L 3G1 Canada) Y Yangning Zhang (School of Biomedical Sciences and Engineering, Guangzhou International Campus) M Maral Vafaie (Department of Mechanical and Industrial Engineering) M Muhammad Imran A Amin Morteza Najarian (Department of Electrical and Computer Engineering) Y Yanjiang Liu (Department of Electrical and Computer Engineering University of Toronto 10 King's College Road Toronto Ontario M5S 3G4 Canada) H Hyeongwoo Ban (Department of Electrical and Computer Engineering University of Toronto 10 King's College Road Toronto Ontario M5S 3G4 Canada) L Laxmi Kishore Sagar (Department of Electrical and Computer Engineering University of Toronto 10 King's College Road Toronto Ontario M5S 3G4 Canada) M Mustafa Yavuz (Waterloo Institute for Nanotechnology, Department of Mechanical and Mechatronics Engineering University of Waterloo 200 University Ave W Waterloo Ontario N2L 3G1 Canada) E Edward H. Sargent

Abstract

Abstract Lead‐free III‐V colloidal quantum dots (CQDs) are of significant interest for their potential in near‐infrared (NIR) to short‐wave infrared (SWIR) photodetection. However, achieving effective surface passivation remains challenging, especially as larger CQD sizes introduce more complex surface facets and compositions while shifting the absorption peak from the NIR to the SWIR range. In this study, a mixed‐halide passivation strategy is developed for large InAs CQDs, an approach that led to a doubling in anti‐oxidation ability and achieves a hole mobility of 0.03 cm 2  Vs −1 . These in turn led to a T90 lifetime of 50 h and enhanced operating stability in photodetectors operating at 1140 nm. Density functional theory (DFT) simulations and facet characterization indicate that exposed facets and edges are well passivated using a mixture of indium halides, which provide a stronger desorption energy compared to single‐halide passivation. This approach yields photodetectors with an external quantum efficiency (EQE) of 75% and a response time of 10 ns, an advance for InAs photodetectors operating at 1140 nm.

Article Details

Volume / Issue Vol. 37, Issue 18
Published May 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (13)

P

Pan Xia

S

Sasa Wang

College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology) Nanjing University of Posts and Telecommunications 9 Wenyuan Road Nanjing 210023 China

Y

Yiqing Chen

Department of Chemistry

A

Ahmet Gulsaran

Waterloo Institute for Nanotechnology, Department of Mechanical and Mechatronics Engineering University of Waterloo 200 University Ave W Waterloo Ontario N2L 3G1 Canada

Y

Yangning Zhang

School of Biomedical Sciences and Engineering, Guangzhou International Campus

M

Maral Vafaie

Department of Mechanical and Industrial Engineering

M

Muhammad Imran

A

Amin Morteza Najarian

Department of Electrical and Computer Engineering

Y

Yanjiang Liu

Department of Electrical and Computer Engineering University of Toronto 10 King's College Road Toronto Ontario M5S 3G4 Canada

H

Hyeongwoo Ban

Department of Electrical and Computer Engineering University of Toronto 10 King's College Road Toronto Ontario M5S 3G4 Canada

L

Laxmi Kishore Sagar

Department of Electrical and Computer Engineering University of Toronto 10 King's College Road Toronto Ontario M5S 3G4 Canada

M

Mustafa Yavuz

Waterloo Institute for Nanotechnology, Department of Mechanical and Mechatronics Engineering University of Waterloo 200 University Ave W Waterloo Ontario N2L 3G1 Canada

E

Edward H. Sargent