Hume-Rothery driven oxidation resilience of binary alloy thin films

M M. D. Homsma (XUV Optics Group, MESA+ Research Institute, Faculty of Science and Technology, University of Twente , PO Box 217, 7500 AE Enschede,) W W. T. E. van den Beld (XUV Optics Group, MESA+ Research Institute, Faculty of Science and Technology, University of Twente , PO Box 217, 7500 AE Enschede,) R R. W. E. van de Kruijs (XUV Optics Group, MESA+ Research Institute, Faculty of Science and Technology, University of Twente , PO Box 217, 7500 AE Enschede,) M M. D. Ackermann (XUV Optics Group, MESA+ Research Institute, Faculty of Science and Technology, University of Twente , PO Box 217, 7500 AE Enschede,)

Abstract

In metallurgy, Hume-Rothery (HR) rules have proven useful in understanding alloying characteristics and requirements. Recently, they have seen application in the design of multi-principal element alloys (MPEAs), particularly for predicting whether a material combination can form single-phase solid solution high entropy alloys (SSPS-HEAs). However, the HR rules have not been shown to predict the interaction of these alloys with oxides, especially concerning surface and surface chemistry. In this work, we investigate how binary alloys transition from crystalline to amorphous phases at a critical structure dissociation temperature, T1, through in-air stepwise annealing of as-deposited metallic crystalline alloys. At this temperature, sufficient thermal energy enables the alloy to transform into an amorphous oxide phase. By plotting T1 against individual HR rules, we explored the correlation between each rule and the onset of the amorphous phase transition, allowing us to predict the temperatures at which alloys undergo phase changes due to oxidation reactions. These findings demonstrate a relationship between the properties described by the Hume-Rothery and its oxidation resilience (meaning the thermodynamic barrier against oxidation reactivity) in MPEA thin films, offering further fundamental insights into alloy oxidation as a whole.

Article Details

Volume / Issue Vol. 138, Issue 23
Published December 21, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (4)

M

M. D. Homsma

XUV Optics Group, MESA+ Research Institute, Faculty of Science and Technology, University of Twente , PO Box 217, 7500 AE Enschede,

W

W. T. E. van den Beld

XUV Optics Group, MESA+ Research Institute, Faculty of Science and Technology, University of Twente , PO Box 217, 7500 AE Enschede,

R

R. W. E. van de Kruijs

XUV Optics Group, MESA+ Research Institute, Faculty of Science and Technology, University of Twente , PO Box 217, 7500 AE Enschede,

M

M. D. Ackermann

XUV Optics Group, MESA+ Research Institute, Faculty of Science and Technology, University of Twente , PO Box 217, 7500 AE Enschede,