High‐Precision 3D Doping of Fused Silica Glass Derived from Nanocomposites

R Richard Prediger (Laboratory of Process Engineering, NeptunLab, Department of Microsystems Engineering (IMTEK) University of Freiburg 79110 Freiburg Germany) S Sebastian Kluck (Laboratory of Process Engineering, NeptunLab, Department of Microsystems Engineering (IMTEK) University of Freiburg 79110 Freiburg Germany) L Leonhard Hambitzer (Laboratory of Process Engineering, NeptunLab, Department of Microsystems Engineering (IMTEK) University of Freiburg 79110 Freiburg Germany) B Bastian E. Rapp (Laboratory of Process Technology NeptunLab Department of Microsystems Engineering (IMTEK) University of Freiburg Georges‐Köhler‐Allee 103 79110 Freiburg Germany) S Silvio Tisato J Josephine N. Häberlein (Electrochemical Energy Systems, IMTEK, Department of Microsystems Engineering (IMTEK) University of Freiburg 79110 Freiburg Germany) D Dorothea Helmer F Frederik Kotz‐Helmer (Laboratory of Process Engineering, NeptunLab, Department of Microsystems Engineering (IMTEK) University of Freiburg 79110 Freiburg Germany)

Abstract

Abstract Glasses are utilized for their outstanding optical, mechanical, and thermal properties. However, conventional production methods mostly yield in glasses with uniform compositions and material properties. Here a novel lithographic approach is presented for high‐resolution 3D dopant integration at defined positions, which enables property modifications in specific regions. For this, a porous glass matrix derived from nanocomposites is shaped using 3D printing or injection molding. Using volumetric 3D printing like computed axial or two‐photon lithography, doping is performed within the porous glass using photocurable metal oxide precursors. The dopant is then permanently integrated within the glass during a final sintering step. The local integration of dopants like Ti 4+ , Co 2+ , Eu 3+ or Tb 3+ allow to selectively change the color, luminescence or refractive index within a 3D‐shaped glass with micron resolution. The process enables a wide range of novel applications from integrated optics and photonics to mass customization, anti‐counterfeiting, and information storage.

Article Details

Volume / Issue Vol. 37, Issue 45
Published November 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (8)

R

Richard Prediger

Laboratory of Process Engineering, NeptunLab, Department of Microsystems Engineering (IMTEK) University of Freiburg 79110 Freiburg Germany

S

Sebastian Kluck

Laboratory of Process Engineering, NeptunLab, Department of Microsystems Engineering (IMTEK) University of Freiburg 79110 Freiburg Germany

L

Leonhard Hambitzer

Laboratory of Process Engineering, NeptunLab, Department of Microsystems Engineering (IMTEK) University of Freiburg 79110 Freiburg Germany

B

Bastian E. Rapp

Laboratory of Process Technology NeptunLab Department of Microsystems Engineering (IMTEK) University of Freiburg Georges‐Köhler‐Allee 103 79110 Freiburg Germany

S

Silvio Tisato

J

Josephine N. Häberlein

Electrochemical Energy Systems, IMTEK, Department of Microsystems Engineering (IMTEK) University of Freiburg 79110 Freiburg Germany

D

Dorothea Helmer

F

Frederik Kotz‐Helmer

Laboratory of Process Engineering, NeptunLab, Department of Microsystems Engineering (IMTEK) University of Freiburg 79110 Freiburg Germany