High-throughput material search by magnetic and compositional mapping of reactively sputtered combinatorial FexVyNz films

S Shelby S. Fields (U.S. Naval Research Laboratory 1 , Washington DC 20375,) O Olaf M. J. van ‘t Erve (Materials Science and Technology Division, U.S. Naval Research Laboratory 2 , Washington DC 20375,) A Andrew McGrath (Niron Magnetics 3 , Minneapolis, Minnesota 55413,) F Francis Johnson (Niron Magnetics 3 , Minneapolis, Minnesota 55413,) S Steven P. Bennett (Materials Science and Technology Division, U.S. Naval Research Laboratory 4 , Washington, District of Columbia 20375,)

Abstract

Despite the many advantages afforded to the investigation of complex compositional systems by combinatorial sputtering, the application of this synthesis technique is hindered by high-throughput characterization bottlenecks. The recent application of translatable compositional and magnetic characterization techniques, such as precision Wavelength Dispersive X-ray Fluorescence (WDXRF) and Magneto-Optic Kerr Effect (MOKE), are enabling for full wafer mapping of film chemistry, magnetic moment, and coercivity, although under-applied. An example system that stands to benefit from the application of combinatorial sputtering and high-throughput characterization is lightly nitrided FexVyNz, which, among other doped FeN materials, is a candidate rare earth-free permanent magnet for electric motor and read/write head applications. Within this report, a combinatorial sputtering and characterization procedure, which leverages high-throughput WDXRF and MOKE mapping, is utilized to investigate the effects of V composition on the room temperature ferromagnetic properties of FexVyNz. Observations made using WDXRF and MOKE mapping are shown to closely agree with vibrating sample magnetometry and x-ray photoelectron spectroscopy measurements made on cleaved regions of interest from the parent wafer. It is observed that the inclusion of V deleteriously affects the saturated moment of FeN, resulting in complete macroscopic reduction at 18 at. %. A maximum film coercivity of 165 Oe is observed at 10 at. % V, likely contributed to by crystallographic texture due to processing, followed by a complete reduction along with the saturated moment. These observations support the high-throughput characterization approaches of WDXRF and MOKE to combinatorial synthesis workflows.

Article Details

Volume / Issue Vol. 137, Issue 2
Published January 14, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (5)

S

Shelby S. Fields

U.S. Naval Research Laboratory 1 , Washington DC 20375,

O

Olaf M. J. van ‘t Erve

Materials Science and Technology Division, U.S. Naval Research Laboratory 2 , Washington DC 20375,

A

Andrew McGrath

Niron Magnetics 3 , Minneapolis, Minnesota 55413,

F

Francis Johnson

Niron Magnetics 3 , Minneapolis, Minnesota 55413,

S

Steven P. Bennett

Materials Science and Technology Division, U.S. Naval Research Laboratory 4 , Washington, District of Columbia 20375,