Journal of Applied Physics

High-rate magnetron sputter deposition of low-stress boron carbide films on tilted substrates

K K. Kawasaki (Lawrence Livermore National Laboratory , Livermore, California 94550,) J J. B. Merlo (Lawrence Livermore National Laboratory , Livermore, California 94550,) S S. Gonzalez (Lawrence Livermore National Laboratory 1 , Livermore, California 94550,) L L. B. Bayu Aji (Lawrence Livermore National Laboratory , Livermore, California 94550,) S S. J. Shin (Lawrence Livermore National Laboratory , Livermore, California 94550,) G G. V. Taylor (Lawrence Livermore National Laboratory , Livermore, California 94550,) A A. M. Engwall-Holmes (Lawrence Livermore National Laboratory 1 , Livermore, California 94550,) M M. Seo (Lawrence Livermore National Laboratory , Livermore, California 94550,) A A. A. Baker (Lawrence Livermore National Laboratory 1 , Livermore, California 94550,) M M. S. Wong (Lawrence Livermore National Laboratory 1 , Livermore, California 94550,) F F. M. O’Neill (Lawrence Livermore National Laboratory 1 , Livermore, California 94550,) S S. O. Kucheyev (Lawrence Livermore National Laboratory , Livermore, California 94550,)

Abstract

Boron carbide is attractive for several applications, including nuclear fuel capsules for inertial confinement fusion (ICF). The fabrication of ICF capsules involves the deposition of ultrathick coatings with density and thickness uniformity on submicron length scales on non-planar (spherical) substrates. Such a deposition requires control of the deposition rate, residual stress, and film microstructure. Here, we systematically study the direct-current magnetron sputter deposition of B4C coatings with a full-face-erosion magnetron source as a function of substrate tilt and Ar working gas pressure. Film properties are correlated with results of plasma diagnostics and predictions of Monte Carlo simulations of ballistic sputtering and gas-phase transport. The fabrication of low-stress amorphous B4C films with deposition rates of 7μm/h is demonstrated.

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Article Details

Volume / Issue Vol. 138, Issue 10
Published September 14, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics
ISSN: 0021-8979 Physical Sciences

Authors (12)

K

K. Kawasaki

Lawrence Livermore National Laboratory , Livermore, California 94550,

J

J. B. Merlo

Lawrence Livermore National Laboratory , Livermore, California 94550,

S

S. Gonzalez

Lawrence Livermore National Laboratory 1 , Livermore, California 94550,

L

L. B. Bayu Aji

Lawrence Livermore National Laboratory , Livermore, California 94550,

S

S. J. Shin

Lawrence Livermore National Laboratory , Livermore, California 94550,

G

G. V. Taylor

Lawrence Livermore National Laboratory , Livermore, California 94550,

A

A. M. Engwall-Holmes

Lawrence Livermore National Laboratory 1 , Livermore, California 94550,

M

M. Seo

Lawrence Livermore National Laboratory , Livermore, California 94550,

A

A. A. Baker

Lawrence Livermore National Laboratory 1 , Livermore, California 94550,

M

M. S. Wong

Lawrence Livermore National Laboratory 1 , Livermore, California 94550,

F

F. M. O’Neill

Lawrence Livermore National Laboratory 1 , Livermore, California 94550,

S

S. O. Kucheyev

Lawrence Livermore National Laboratory , Livermore, California 94550,

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