High-quality GeSn grown in foundry mode via chemical vapor deposition enabling lasing up to 235 K

S Sudip Acharya (Materials Science and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,) A Alec Fischer (Lawerence Semiconductor Research Laboratory, Inc. 3 , 2300 West Huntington Drive, Tempe, Arizona 85282,) N Nicholas Rosson (Lawerence Semiconductor Research Laboratory, Inc. 3 , 2300 West Huntington Drive, Tempe, Arizona 85282,) A Abdulla Said (Materials Science and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,) H Hryhorii Stanchu (Institute for Nanoscience and Engineering, University of Arkansas 4 , Fayetteville, Arkansas 72701,) Q Quang Minh Thai (Department of Electrical Engineering and Computer Science, University of Arkansas 2 , Fayetteville, Arkansas 72710,) B Bruce Claflin (Air Force Research Laboratory 3 , 2241 Avionics Circle, Wright-Patterson AFB, Dayton, Ohio 45433,) G Gregory Forcherio (Naval Surface Warfare Center, Crane Division 6 , Crane, Indiana 47522,) G Greg Sun (Naval Surface Warfare Center 5 , Electro-Optics Tech. Div. 300 Highway 361, Crane, Indiana 47522,) R Robin Scott (Lawerence Semiconductor Research Laboratory, Inc. 3 , 2300 West Huntington Drive, Tempe, Arizona 85282,) W Wei Du (Department of Urological Surgery Zhujiang Hospital Southern Medical University Guangzhou China) S Shui-Qing Yu (Department of Electrical Engineering and Computer Science, University of Arkansas 2 , Fayetteville, Arkansas 72710,)

Abstract

Using a commercial chemical vapor deposition reactor operated in foundry mode, we rapidly developed high-quality, high-Sn-content GeSn growth recipes within just a few months from the initial trials. A recently discovered growth strategy—spontaneous-relaxation-enhanced (SRE) Sn incorporation—was employed to produce thick, low-defect GeSn layers. We conducted a comprehensive study of GeSn alloys with Sn compositions ranging from 3.1% to 18.2%. All samples exhibited strong room-temperature photoluminescence, confirming excellent material quality. For higher-Sn compositions, optically pumped lasing was achieved at wavelengths beyond 3.3 μm over a temperature range of 77–235 K, with a threshold power density of 338 kW/cm2 at 77 K. The demonstrated combination of foundry-mode operation and SRE-based growth offers a robust, scalable route for rapid GeSn material development, facilitating technology transfer to commercial foundries and accelerating progress toward GeSn-based photonic integration.

Article Details

Volume / Issue Vol. 138, Issue 17
Published November 07, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (12)

S

Sudip Acharya

Materials Science and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,

A

Alec Fischer

Lawerence Semiconductor Research Laboratory, Inc. 3 , 2300 West Huntington Drive, Tempe, Arizona 85282,

N

Nicholas Rosson

Lawerence Semiconductor Research Laboratory, Inc. 3 , 2300 West Huntington Drive, Tempe, Arizona 85282,

A

Abdulla Said

Materials Science and Engineering, University of Arkansas 1 , Fayetteville, Arkansas 72701,

H

Hryhorii Stanchu

Institute for Nanoscience and Engineering, University of Arkansas 4 , Fayetteville, Arkansas 72701,

Q

Quang Minh Thai

Department of Electrical Engineering and Computer Science, University of Arkansas 2 , Fayetteville, Arkansas 72710,

B

Bruce Claflin

Air Force Research Laboratory 3 , 2241 Avionics Circle, Wright-Patterson AFB, Dayton, Ohio 45433,

G

Gregory Forcherio

Naval Surface Warfare Center, Crane Division 6 , Crane, Indiana 47522,

G

Greg Sun

Naval Surface Warfare Center 5 , Electro-Optics Tech. Div. 300 Highway 361, Crane, Indiana 47522,

R

Robin Scott

Lawerence Semiconductor Research Laboratory, Inc. 3 , 2300 West Huntington Drive, Tempe, Arizona 85282,

W

Wei Du

Department of Urological Surgery Zhujiang Hospital Southern Medical University Guangzhou China

S

Shui-Qing Yu

Department of Electrical Engineering and Computer Science, University of Arkansas 2 , Fayetteville, Arkansas 72710,