High-pressure structural stability of compositionally complex pyrochlore oxides

V Venkata S. Bhadram (Division of Sciences, Krea University 1 , Sri City, Andhra Pradesh 517646,) M Muthukumar Abishek (Laboratory for High Performance Ceramics, Department of Metallurgical and Materials Engineering, Indian Institute of Technology—Madras (IIT Madras) 2 , Chennai 600036,) M Muthukumaran Sundaramoorthy D Dhanya Radhakrishnan (Division of Sciences, Krea University 1 , Sri City, Andhra Pradesh 517646,) B Boby Joseph B Branko Matović (Centre of Excellence—CextremeLab Vinca, Institute of Nuclear Sciences Vinca, University of Belgrade 5 , Mike Petrovica Alasa 12-14, Belgrade 11000,) R Ravi Kumar

Abstract

Compositionally complex oxides (CCOs) present immense potential for tailoring physical properties across a broad compositional landscape. Understanding their structural stability and tunability, particularly under external pressure, is crucial for advancing their functional applications. In this study, we investigate the impact of hydrostatic pressure on the crystal structure and cation ordering of three partially ordered transition metal and rare-earth-based CCO compositions, all stabilized in the pyrochlore structure-type. Using in situ high-pressure synchrotron x-ray powder diffraction (SXRD) and Raman spectroscopy, conducted with the diamond anvil cell (DAC) technique, we found that the pyrochlore phase remains stable up to pressures of 17–20 GPa at room temperature. The isothermal bulk moduli, determined by fitting the pressure–volume data to a third-order Birch–Murnaghan equation of state, range from 168 to 179 GPa. Raman spectroscopy results corroborate the SXRD findings, further confirming the structural robustness of the pyrochlore phase under high pressures. Moreover, analysis of the pressure-dependent relative intensities of selected Raman modes offers insights into pressure-induced modifications in cation ordering within these compounds.

Article Details

Volume / Issue Vol. 138, Issue 10
Published September 14, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (7)

V

Venkata S. Bhadram

Division of Sciences, Krea University 1 , Sri City, Andhra Pradesh 517646,

M

Muthukumar Abishek

Laboratory for High Performance Ceramics, Department of Metallurgical and Materials Engineering, Indian Institute of Technology—Madras (IIT Madras) 2 , Chennai 600036,

M

Muthukumaran Sundaramoorthy

D

Dhanya Radhakrishnan

Division of Sciences, Krea University 1 , Sri City, Andhra Pradesh 517646,

B

Boby Joseph

B

Branko Matović

Centre of Excellence—CextremeLab Vinca, Institute of Nuclear Sciences Vinca, University of Belgrade 5 , Mike Petrovica Alasa 12-14, Belgrade 11000,

R

Ravi Kumar