High-pressure lattice dynamics study of few-layer <i>α</i> -In2Se3

S Shiyu Feng A Anurag Ghosh (Department of Materials Science and Engineering, Technion—Israel Institute of Technology 2 , Haifa 3200003,) G Gautham Vijayan (Nanoscale Electronic Materials and Devices Laboratory, Faculty of Materials Science and Engineering, Technion—Israel Institute of Technology , Haifa 3200003,) Z Ziyi Xu Q Qian Zhang E Elad Koren (Department of Materials Science and Engineering, Technion-Israel Institute of Technology 2 , Haifa 3200003,) E Elissaios Stavrou (Department of Materials Science and Engineering, Guangdong Technion-Israel Institute of Technology 1 , Shantou 515063,)

Abstract

Few-layer α-In2Se3 has been studied under pressure by Raman spectroscopy in a diamond anvil cell up to 60 GPa (at room temperature). A combination of AFM and Raman was used to estimate the thickness of the specimens. While few-layer α-In2Se3 shows identical structural evolution with one of the bulk powder-like forms of α-In2Se3 (α→β′→ IV), an abrupt (with respect to the narrow pressure range of the coexistence of the two phases) β′→ IV phase transition (at ≈45 GPa) was observed, in contrast to the case of the bulk specimen where the two phases coexist over a wide pressure range. This is attributed to the difference in the specimen morphology, i.e., single crystal and powder in the case of few-layer and bulk α-In2Se3, respectively. This study documents the significance of the specimen morphology on the observed pressure-induced phase transitions. The methodology developed in this study for performing high-pressure Raman measurements can be applied to other nanodimensional layered materials.

Article Details

Volume / Issue Vol. 139, Issue 6
Published February 14, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (7)

S

Shiyu Feng

A

Anurag Ghosh

Department of Materials Science and Engineering, Technion—Israel Institute of Technology 2 , Haifa 3200003,

G

Gautham Vijayan

Nanoscale Electronic Materials and Devices Laboratory, Faculty of Materials Science and Engineering, Technion—Israel Institute of Technology , Haifa 3200003,

Z

Ziyi Xu

Q

Qian Zhang

E

Elad Koren

Department of Materials Science and Engineering, Technion-Israel Institute of Technology 2 , Haifa 3200003,

E

Elissaios Stavrou

Department of Materials Science and Engineering, Guangdong Technion-Israel Institute of Technology 1 , Shantou 515063,