High Performance Ultrawide Temperature Range Planar Hall Devices by 2D Hidden‐Rashba Systems

Z Zhibin Qi (School of Physics State Key Laboratory of Silicon Materials, and Institute for Advanced Studies of Physics Zhejiang University Hangzhou 310058 China) X Xiangyu Hu C Chenqiang Hua (Hangzhou International Innovation Institute Beihang University Hangzhou 311115 China) Y Yuqiang Huang Y Yunhao Lu (School of Physics) H Hengzhe Lu (School of Physics State Key Laboratory of Silicon Materials, and Institute for Advanced Studies of Physics Zhejiang University Hangzhou 310058 China) X Xin Cao M Minjie Zhang K Kenji Watanabe T Takashi Taniguchi D Dongchen Qi (School of Mechanical, Medical and Process Engineering) J Junwei Liu Y Yi Zheng

Abstract

Abstract Lattice symmetry determines the manifestations of the spin‐orbit coupling (SOC) effect in crystals, e.g. spin polarizations in hidden‐spin Rashba systems are concealed by the sublattice inversion symmetry, making spintronic applications impractical with negligible spin lifetimes. Here, high performance planar Hall effect (PHE) devices based on van der Waals 1T‐PtSe 2 thin films with hidden‐Rashba spins are reported. By temperature‐ and layer‐dependent magneto‐transport, the quantum signature of the hidden‐Rashba PHE is unveiled, which exhibits suppressed backscattering for parallelled electric and magnetic fields, and thus, produces an opposite sign to the conventional Rashba‐rooted PHE signals. The inherent strong hidden‐spin SOC allows high performance magnetic device operations from 0.3 K to room temperature (RT), exhibiting an ultralow working heat load of 1 nW below 80 K and retaining a superior RT signal‐to‐noise ratio exceeding 18 000. It is demonstrated that, by eliminating defects and via optimizing device structure, the sensitivity of hidden‐Rashba PHE devices can be efficiently improved to exceed the commercial Hall sensors, making 2D hidden‐spin Rashba systems a promising material platform for spintronics.

Article Details

Volume / Issue Vol. 37, Issue 47
Published November 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (13)

Z

Zhibin Qi

School of Physics State Key Laboratory of Silicon Materials, and Institute for Advanced Studies of Physics Zhejiang University Hangzhou 310058 China

X

Xiangyu Hu

C

Chenqiang Hua

Hangzhou International Innovation Institute Beihang University Hangzhou 311115 China

Y

Yuqiang Huang

Y

Yunhao Lu

School of Physics

H

Hengzhe Lu

School of Physics State Key Laboratory of Silicon Materials, and Institute for Advanced Studies of Physics Zhejiang University Hangzhou 310058 China

X

Xin Cao

M

Minjie Zhang

K

Kenji Watanabe

T

Takashi Taniguchi

D

Dongchen Qi

School of Mechanical, Medical and Process Engineering

J

Junwei Liu

Y

Yi Zheng