Growth of Monolayer WS₂ Lateral Homojunctions via <i>In Situ</i> Domain Engineering

Qilong Cui

National Synchrotron Radiation Laboratory, State Key Laboratory of Precision and Intelligent Chemistry, School of Nuclear Science and Technology

Hongwei Shou

Hefei National Research Center for Physical Sciences at the Microscales, State Key Laboratory of Precision and Intelligent Chemistry, School of Chemistry and Materials Science

Chuanqiang Wu

Information Materials and Intelligent Sensing Laboratory of Anhui Province, Institutes of Physical Science and Information Technology

Bijun Tang

School of Materials Science and Engineering

Wen Zhu

Yuyang Cao

National Synchrotron Radiation Laboratory, State Key Laboratory of Precision and Intelligent Chemistry, School of Nuclear Science and Technology

Wei Jiang

Pengjun Zhang

National Synchrotron Radiation Laboratory, State Key Laboratory of Precision and Intelligent Chemistry, School of Nuclear Science and Technology

Ruijie Wang

National Synchrotron Radiation Laboratory, State Key Laboratory of Precision and Intelligent Chemistry, School of Nuclear Science and Technology

Zhanfeng Liu

National Synchrotron Radiation Laboratory, State Key Laboratory of Precision and Intelligent Chemistry, School of Nuclear Science and Technology

Shiqiang Wei

National Synchrotron Radiation Laboratory, State Key Laboratory of Precision and Intelligent Chemistry

Shuangming Chen

National Synchrotron Radiation Laboratory, State Key Laboratory of Precision and Intelligent Chemistry

Binghui Ge

State Key Laboratory of Opto-Electronic Information Acquisition and Protection Technology, Anhui University, Hefei, China.

Xiaojun Wu

Zheng Liu

Li Song