FeSiB <sub>2</sub> : A Hard Semiconducting Open-Framework Iron Silico-boride
Article Details
Journal Info
Journal of the American Chemical Society
American Chemical Society
Authors (23)
Junkai Li
Center for High Pressure Science and Technology Advanced Research
Wenju Zhou
Center for High Pressure Science and Technology Advanced Research
Donghan Jia
Center for High Pressure Science and Technology Advanced Research
Yehua Huang
Center for High Pressure Science and Technology Advanced Research
Xinyu Wang
Guoliang Niu
Peiyang Mu
Center for High Pressure Science and Technology Advanced Research
Shijing Zhao
Center for High Pressure Science and Technology Advanced Research
Shengbo Cao
Center for High Pressure Science and Technology Advanced Research
Zhenyuan Guo
Center for High Pressure Science and Technology Advanced Research
Xuan Chen
Kefeng Liu
Center for High Pressure Science and Technology Advanced Research
Biao Wan
Key Laboratory of Materials Physics of Ministry of Education, School of Physics and Laboratory of Zhongyuan Light
Peng Zhang
Fuyang Liu
Center for High Pressure Science and Technology Advanced Research
Bingmin Yan
Chunyin Zhou
Shanghai Advanced Research Institute
João Elias F. S. Rodrigues
European Synchrotron Radiation Facility ESRF, 71 Avenue des Martyrs, CSS40220, 38043 Cedex 9, Grenoble, France
Jun Deng
Center for High Pressure Science and Technology Advanced Research
Qingyang Hu
Center for High Pressure Science and Technology Advanced Research (HPSTAR)
Ke Yang
Mohamed Mezouar
European Synchrotron Radiation Facility ESRF, 71 Avenue des Martyrs, CSS40220, 38043 Cedex 9, Grenoble, France
Huiyang Gou