Ferroelectricity and magnetic order at room temperature and electronic states of bismuth iron oxyfluoride thin films

A Akiko Kamigaito (Department of Chemistry, Faculty of Science, Ochanomizu University 1 , Tokyo 112-8610,) M Mizuho Sano (Department of Chemistry, Faculty of Science, Ochanomizu University 1 , Tokyo 112-8610,) K Kei Shigematsu (Materials and Structures Laboratory, Institute of Integrated Research) S Satoshi Demura H Hiroshi Kumigashira T Tsukasa Katayama (Research Institute for Electronic Science, Hokkaido University 1 , N20W10, Kita, Sapporo 001-0020,) Y Yasushi Hirose (Department of Chemistry, Graduate School of Science, Tokyo Metropolitan University 2 , 1-1 Minami-Osawa, Hachioji, Tokyo 192-0397,) A Akira Chikamatsu (Department of Chemistry, Faculty of Science, Ochanomizu University 1 , Tokyo 112-8610,)

Abstract

Iron oxyfluorides with large tetragonal polar distortions are expected to exhibit multiferroic properties that coexist with their ferroelectric and magnetic orders. However, oxyfluoride multiferroicity has not been experimentally confirmed in polycrystals, owing to their high leakage currents and the presence of impurity phases. In this study, we fabricated single-crystalline Ba-doped bismuth iron oxyfluoride thin films by combining pulsed laser deposition with topochemical fluorination and investigated their room-temperature ferroelectric and magnetic properties. The substitution of Ba at the Bi site in the precursor films was found to play an important role in the introduction of fluorine into the precursor. The Bi1−xBaxFeO3−xFx (x = 0.2, 0.3) films exhibited ferroelectricity and a small magnetization at 300 K. Moreover, electronic structures due to the F 2p states were formed in the valence and conduction bands of the Bi1−xBaxFeO3−xFx (x = 0.2, 0.3) films. The findings demonstrate the potential of oxyfluoride compounds, thereby broadening the range of materials that can be used as room-temperature multiferroics.

Article Details

Volume / Issue Vol. 137, Issue 21
Published June 07, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (8)

A

Akiko Kamigaito

Department of Chemistry, Faculty of Science, Ochanomizu University 1 , Tokyo 112-8610,

M

Mizuho Sano

Department of Chemistry, Faculty of Science, Ochanomizu University 1 , Tokyo 112-8610,

K

Kei Shigematsu

Materials and Structures Laboratory, Institute of Integrated Research

S

Satoshi Demura

H

Hiroshi Kumigashira

T

Tsukasa Katayama

Research Institute for Electronic Science, Hokkaido University 1 , N20W10, Kita, Sapporo 001-0020,

Y

Yasushi Hirose

Department of Chemistry, Graduate School of Science, Tokyo Metropolitan University 2 , 1-1 Minami-Osawa, Hachioji, Tokyo 192-0397,

A

Akira Chikamatsu

Department of Chemistry, Faculty of Science, Ochanomizu University 1 , Tokyo 112-8610,