Fatigue-free ferroelectricity in Hf0.5Zr0.5O2 ultrathin films via interfacial design

C Chao Zhou (School of Natural Sciences, Department Chemie, and Catalysis Research Center (CRC), Technische Universität München, Lichtenbergstrasse 4, 85747 Garching, Germany) Y Yanpeng Feng L Liyang Ma H Haoliang Huang Y Yangyang Si H Hailin Wang (Tsinghua Institute of Multidisciplinary Biomedical Research) S Sizhe Huang J Jingxuan Li C Chang-Yang Kuo (National Synchrotron Radiation Research Center) S Sujit Das (Department of Chemistry) Y Yunlong Tang S Shi Liu (Department of Chemistry, School of Science and Research Center for Industries of the Future) Z Zuhuang Chen