Extending the Temperature and Time Operating Windows of CsPbI <sub>3</sub> Quantum Dots for Scalable Synthesis for LEDs

J Jianxun Wang (School of Basic Medicine, Qingdao University, Qingdao, China.) S Shuo Li H Hongxin Tao (Key Laboratory of Automobile Materials MOE School of Materials Science and Engineering Jilin University Changchun P. R. China) J Jing Li B Bo Gao (College of Energy, Institute of Functional Nano and Soft Materials (FUNSOM), Jiangsu Key Laboratory of Advanced Negative Carbon Technologies, Soochow University, Suzhou, China.) X Xiaoyu Zhang

Abstract

ABSTRACT Large‐scale manufacturing of CsPbI 3 quantum dots (QDs) is hindered by narrow thermal and temporal operating windows, where slight deviations in temperature or reaction time can induce size de‐focusing via Ostwald ripening and α‐to‐δ phase transformation, leading to performance loss and poor reproducibility. Here we demonstrate that phenylphosphonic acid (PPA), with its strong chelating capability and moderate acidity, creates a synergistic effect between robust coordination and etching, resulting in colloidal system stabilization and effective removal of overgrown particles, thereby extending the synthesis window for CsPbI 3 QDs in hot‐injection. As a result, the synthesis window is extended from less than 30 min to over 8 h without phase transition, and increases the temperature tolerance. The PPA‐stabilized QDs exhibit low Urbach energy (28.2 meV), high photoluminescence quantum yield (99.8%), and narrow emission bandwidth (34.5 nm) at 667 nm, indicating minimal defects. In light‐emitting devices, large‐scale synthesized QDs have a peak external quantum efficiency of 30.7%, showing the possibility of scaling up optoelectronic devices. By converting a fragile synthesis into a forgiving process window, the synergistic strategy for etch and strong bonding advances the industrial viability of red perovskite QD inks and devices.

Article Details

Volume / Issue Vol. 65, Issue 11
Published March 09, 2026
ISSN 1433-7851
Publisher Wiley

Journal Info

Angewandte Chemie International Edition

Wiley

ISSN: 1433-7851 Physical Sciences

Authors (6)

J

Jianxun Wang

School of Basic Medicine, Qingdao University, Qingdao, China.

S

Shuo Li

H

Hongxin Tao

Key Laboratory of Automobile Materials MOE School of Materials Science and Engineering Jilin University Changchun P. R. China

J

Jing Li

B

Bo Gao

College of Energy, Institute of Functional Nano and Soft Materials (FUNSOM), Jiangsu Key Laboratory of Advanced Negative Carbon Technologies, Soochow University, Suzhou, China.

X

Xiaoyu Zhang