Experimentally Mapping the Elemental Doping of MoS <sub>2</sub> Monolayer

Z Zunaira Urooj (CAS Key Laboratory of Standardization and Measurement for Nanotechnology NCNST‐OU collaborative laboratory National Center for Nanoscience and Technology Beijing P. R. China) Y You Li (MIIT Key Laboratory of Semiconductor Microstructure and Quantum Sensing, School of Physics) J Junxu Mao (University of Chinese Academy of Sciences Beijing P. R. China) H Haiming Sun (SANKEN (The Institute of Scientific and Industrial Research), Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka, Japan.) T Ting Tan (Chinese Academy of Sciences (CAS) Key Laboratory of Theoretical and Computational Nanoscience, CAS Center for Excellence in Nanoscience) J Junjie Qi (School of Chemical Engineering and Technology Hebei University of Technology Tianjin 300401 P.R. China) J Juanxia Wu (CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience) Q Qiang Zheng T Tariq Abbas M Misbah Younas (CAS Key Laboratory of Standardization and Measurement for Nanotechnology NCNST‐OU collaborative laboratory National Center for Nanoscience and Technology Beijing P. R. China) H Honggang Wang Y Yuansha Chen (Beijing National Laboratory for Condensed Matter Physics and Institute of Physics) K Kazutomo Suenaga (NCNST‐OU collaborative laboratory SANKEN The Institute of Scientific and Industrial Research) The University of Osaka Osaka Japan) L Liming Xie (CAS Key Laboratory of Standardization and Measurement for Nanotechnology)

Abstract

ABSTRACT For the atomically thin 2D semiconductors with great potentials in the post Moore's era, the doping is a prerequisite for the device engineering and integration. Limited by the doping approaches, elemental doping of 2D semiconductors has not been fully explored. Here, by using a liquid phase edge epitaxy method which can dissolve the dopants in the liquid phase, we have succeeded in doping MoS 2 monolayer with more than 40 elements (including transition metals, lanthanides, and main group elements). In this doping library, rarely observed p ‐type transport behavior has been obtained in Ti, Zn, and Au doped MoS 2 monolayers. While Cu, Ga, Zr, Nb, In, Sn, Hf, Ta, Pb, Bi and rare earth of Eu, Gd, Tm, Lu doped MoS 2 monolayers have showed low on/off ratios (&lt;10). The obtained p ‐type, n ‐type and metallic MoS 2 monolayers enables future all‐MoS 2 based device integration. Additionally, rare earth of Ce, Nd, Dy and Ho doped MoS 2 monolayers have showed soft magnetization with semiconducting transport behavior. At last, DFT calculations have revealed that the preferred doping configurations varies for different elements from Mo‐substitution, S‐substitution to S‐site adsorption.

Article Details

Volume / Issue Vol. 38, Issue 20
Published April 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (14)

Z

Zunaira Urooj

CAS Key Laboratory of Standardization and Measurement for Nanotechnology NCNST‐OU collaborative laboratory National Center for Nanoscience and Technology Beijing P. R. China

Y

You Li

MIIT Key Laboratory of Semiconductor Microstructure and Quantum Sensing, School of Physics

J

Junxu Mao

University of Chinese Academy of Sciences Beijing P. R. China

H

Haiming Sun

SANKEN (The Institute of Scientific and Industrial Research), Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka, Japan.

T

Ting Tan

Chinese Academy of Sciences (CAS) Key Laboratory of Theoretical and Computational Nanoscience, CAS Center for Excellence in Nanoscience

J

Junjie Qi

School of Chemical Engineering and Technology Hebei University of Technology Tianjin 300401 P.R. China

J

Juanxia Wu

CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience

Q

Qiang Zheng

T

Tariq Abbas

M

Misbah Younas

CAS Key Laboratory of Standardization and Measurement for Nanotechnology NCNST‐OU collaborative laboratory National Center for Nanoscience and Technology Beijing P. R. China

H

Honggang Wang

Y

Yuansha Chen

Beijing National Laboratory for Condensed Matter Physics and Institute of Physics

K

Kazutomo Suenaga

NCNST‐OU collaborative laboratory SANKEN The Institute of Scientific and Industrial Research) The University of Osaka Osaka Japan

L

Liming Xie

CAS Key Laboratory of Standardization and Measurement for Nanotechnology