Exceptional Oxidation Resistance of High‐Entropy Carbides up to 3600 °C

Z Zihao Wen Y Yiwen Liu J Jing Yang Y Yuhui Chen (State Key Laboratory of Silicon and Advanced Semiconductor Materials and Center of Electron Microscopy, School of Materials Science and Engineering) Y Yaming Fu (School of Materials Science and Engineering South China University of Technology Guangzhou 510641 China) L Lei Zhuang H Hulei Yu Y Yanhui Chu

Abstract

Abstract Achieving exceptional oxidation resistance at elevated temperatures is long desirable for ultrahigh‐temperature materials to be used in relevant applications such as hypersonic flights, re‐entry vehicles, and propulsion systems. However, their practical service temperatures are typically limited to below 3000 °C. Here, the exploration of (Hf, Ta, Zr, W)C high‐entropy carbides with exceptional oxidation resistance of 2.7 µm·s −1 up to 3600 °C through a high‐entropy compositional engineering strategy is reported. This impressive oxidation behavior arises from the formation of unique dual‐structural oxide layers involving numerous high‐melting‐point W particles uniformly embedded within molten (Hf, Me) 6 (Ta, Me) 2 O 17 (Me = metal element, Hf, Ta, Zr, and W) primary oxides. The developed (Hf, Ta, Zr, W)C demonstrates a significant breakthrough for ultrahigh‐temperature applications up to 3600 °C, paving the way for further design of advanced ultrahigh‐temperature materials capable of serving at higher service temperatures.

Article Details

Volume / Issue Vol. 37, Issue 34
Published August 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (8)

Z

Zihao Wen

Y

Yiwen Liu

J

Jing Yang

Y

Yuhui Chen

State Key Laboratory of Silicon and Advanced Semiconductor Materials and Center of Electron Microscopy, School of Materials Science and Engineering

Y

Yaming Fu

School of Materials Science and Engineering South China University of Technology Guangzhou 510641 China

L

Lei Zhuang

H

Hulei Yu

Y

Yanhui Chu