Evolution of the near-infrared-to-ultraviolet model dielectric function of InAs from room temperature to 250 °C determined by spectroscopic ellipsometry

P Preston R. Sorensen (Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,) U Ufuk Kilic (Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,) Y Yousra Traouli (Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,) R Rafał Korlacki (J.A. Woollam Co, Inc 1 ., Lincoln, Nebraska 68508,) E Eva Schubert (Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,) M Mathias Schubert (Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,)

Abstract

We present a model dielectric function composed of critical point functions in order to parameterize the temperature and wavelength dependencies of the dielectric function of InAs. This model is based on Adachi’s critical point model, with simple wavelength-dependent analytical functions whose parameters change linearly with temperature. The calculated dielectric function at room temperature is in excellent agreement with previously published data. We apply this model in the spectral range of 0.7–5 eV and in the temperature range of room temperature to 250°C with in situ spectroscopic ellipsometry measurements on an InAs substrate. Spectroscopic measurements were performed continuously while slowly ramping sample temperature in a stepwise manner in the controlled ambient environment of an atomic layer deposition system. We find that our model matches excellently with all experimental data with deviations less than 2% in pseudoepsilon. Our model permits smooth interpolation of the dielectric function of InAs for any intermediate temperature in the range studied and therefore can be used to monitor temperature, for example, during thin film deposition processes by in situ spectroscopic ellipsometry. We propose that this model can be applied to other semiconductors as well as wider temperature ranges.

Article Details

Volume / Issue Vol. 139, Issue 20
Published May 28, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (6)

P

Preston R. Sorensen

Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,

U

Ufuk Kilic

Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,

Y

Yousra Traouli

Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,

R

Rafał Korlacki

J.A. Woollam Co, Inc 1 ., Lincoln, Nebraska 68508,

E

Eva Schubert

Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,

M

Mathias Schubert

Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,